Polish pipe -line system and last lower wall grind mechanism

The utility model provides a polish pipe -line system and last lower wall grind mechanism relates to the optical equipment field of throwing. This polish pipe -line system is including supplying liquid device and polish accumulator, and the polish accumulator is provided with annular reservoir, supp...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SILVESTRE HENRI, KONG MANHONG
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SILVESTRE HENRI
KONG MANHONG
description The utility model provides a polish pipe -line system and last lower wall grind mechanism relates to the optical equipment field of throwing. This polish pipe -line system is including supplying liquid device and polish accumulator, and the polish accumulator is provided with annular reservoir, supply the liquid device to provide the polish in to the reservoir through the transfer line, still be provided with the play liquid hole that communicates with the reservoir on the polish accumulator, through a liquid hole to treating that cooling device carries the polish. Going up lower wall grindingmechanism and including polish pipe -line system as above, still include first cooling body and second cooling body, first cooling body includes the first cooler pan that a plurality of range upon range of fixed connection are in the same place, cooling channel has between two upper and lower adjacent first cooler pans, the terminal surface is used for fixed hanging wall rinding body under the first cooler pan of lower f
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN207027223UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN207027223UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN207027223UU3</originalsourceid><addsrcrecordid>eNrjZLAJyM_JLM5QKMgsSFXQzcnMS1UoriwuSc1VSMxLUchJLC5RyMkvTy1SKE_MyVFIL8oEiuamJmck5mUW5_IwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknhnPyMDcwMjcyMj49BQY6IUAQAUrDAp</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Polish pipe -line system and last lower wall grind mechanism</title><source>esp@cenet</source><creator>SILVESTRE HENRI ; KONG MANHONG</creator><creatorcontrib>SILVESTRE HENRI ; KONG MANHONG</creatorcontrib><description>The utility model provides a polish pipe -line system and last lower wall grind mechanism relates to the optical equipment field of throwing. This polish pipe -line system is including supplying liquid device and polish accumulator, and the polish accumulator is provided with annular reservoir, supply the liquid device to provide the polish in to the reservoir through the transfer line, still be provided with the play liquid hole that communicates with the reservoir on the polish accumulator, through a liquid hole to treating that cooling device carries the polish. Going up lower wall grindingmechanism and including polish pipe -line system as above, still include first cooling body and second cooling body, first cooling body includes the first cooler pan that a plurality of range upon range of fixed connection are in the same place, cooling channel has between two upper and lower adjacent first cooler pans, the terminal surface is used for fixed hanging wall rinding body under the first cooler pan of lower f</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180223&amp;DB=EPODOC&amp;CC=CN&amp;NR=207027223U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180223&amp;DB=EPODOC&amp;CC=CN&amp;NR=207027223U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SILVESTRE HENRI</creatorcontrib><creatorcontrib>KONG MANHONG</creatorcontrib><title>Polish pipe -line system and last lower wall grind mechanism</title><description>The utility model provides a polish pipe -line system and last lower wall grind mechanism relates to the optical equipment field of throwing. This polish pipe -line system is including supplying liquid device and polish accumulator, and the polish accumulator is provided with annular reservoir, supply the liquid device to provide the polish in to the reservoir through the transfer line, still be provided with the play liquid hole that communicates with the reservoir on the polish accumulator, through a liquid hole to treating that cooling device carries the polish. Going up lower wall grindingmechanism and including polish pipe -line system as above, still include first cooling body and second cooling body, first cooling body includes the first cooler pan that a plurality of range upon range of fixed connection are in the same place, cooling channel has between two upper and lower adjacent first cooler pans, the terminal surface is used for fixed hanging wall rinding body under the first cooler pan of lower f</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAJyM_JLM5QKMgsSFXQzcnMS1UoriwuSc1VSMxLUchJLC5RyMkvTy1SKE_MyVFIL8oEiuamJmck5mUW5_IwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknhnPyMDcwMjcyMj49BQY6IUAQAUrDAp</recordid><startdate>20180223</startdate><enddate>20180223</enddate><creator>SILVESTRE HENRI</creator><creator>KONG MANHONG</creator><scope>EVB</scope></search><sort><creationdate>20180223</creationdate><title>Polish pipe -line system and last lower wall grind mechanism</title><author>SILVESTRE HENRI ; KONG MANHONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN207027223UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SILVESTRE HENRI</creatorcontrib><creatorcontrib>KONG MANHONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SILVESTRE HENRI</au><au>KONG MANHONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polish pipe -line system and last lower wall grind mechanism</title><date>2018-02-23</date><risdate>2018</risdate><abstract>The utility model provides a polish pipe -line system and last lower wall grind mechanism relates to the optical equipment field of throwing. This polish pipe -line system is including supplying liquid device and polish accumulator, and the polish accumulator is provided with annular reservoir, supply the liquid device to provide the polish in to the reservoir through the transfer line, still be provided with the play liquid hole that communicates with the reservoir on the polish accumulator, through a liquid hole to treating that cooling device carries the polish. Going up lower wall grindingmechanism and including polish pipe -line system as above, still include first cooling body and second cooling body, first cooling body includes the first cooler pan that a plurality of range upon range of fixed connection are in the same place, cooling channel has between two upper and lower adjacent first cooler pans, the terminal surface is used for fixed hanging wall rinding body under the first cooler pan of lower f</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN207027223UU
source esp@cenet
subjects DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
title Polish pipe -line system and last lower wall grind mechanism
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T21%3A32%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SILVESTRE%20HENRI&rft.date=2018-02-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN207027223UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true