Heat radiator for LEDUV photocuring equipment
The utility model discloses a heat radiator for LEDUV photocuring equipment, which comprises the components of a lampshade, the LED lamp is installed to the rear end of lamp shade, and the front end of lamp shade cup joints and install the copper sheathing, peg graft and install the heat pipe in the...
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| creator | XU TAIYANG |
| description | The utility model discloses a heat radiator for LEDUV photocuring equipment, which comprises the components of a lampshade, the LED lamp is installed to the rear end of lamp shade, and the front end of lamp shade cup joints and install the copper sheathing, peg graft and install the heat pipe in the rear end of copper sheathing, and there is a connection piece rear end of copper sheathing through the screw connection, the rear end array of connection piece has the heat radiation fins who cup joints on the heat pipe, and the center department that the rear end of copper sheathing is lieing in heat radiation fins is provided with the fan, the utility model provides a heat abstractor of LRD UV photocuring equipment, the combination has utilized the fan, the heat pipe, heat radiation fins and semiconductor refrigeration piece, can adopt different heat dissipation grades according to photocuring equipment's real work demand respectively, consequently, can effectually dispel the heat to photocuring equipment, and c |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN206122113UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN206122113UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN206122113UU3</originalsourceid><addsrcrecordid>eNrjZND1SE0sUShKTMlMLMkvUkgDYh9Xl9AwhYKM_JL85NKizLx0hdTC0syC3NS8Eh4G1rTEnOJUXijNzaDk5hri7KGbWpAfn1pckJicmpdaEu_sZ2RgZmhkZGhoHBpqTJQiAPKgKpU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Heat radiator for LEDUV photocuring equipment</title><source>esp@cenet</source><creator>XU TAIYANG</creator><creatorcontrib>XU TAIYANG</creatorcontrib><description>The utility model discloses a heat radiator for LEDUV photocuring equipment, which comprises the components of a lampshade, the LED lamp is installed to the rear end of lamp shade, and the front end of lamp shade cup joints and install the copper sheathing, peg graft and install the heat pipe in the rear end of copper sheathing, and there is a connection piece rear end of copper sheathing through the screw connection, the rear end array of connection piece has the heat radiation fins who cup joints on the heat pipe, and the center department that the rear end of copper sheathing is lieing in heat radiation fins is provided with the fan, the utility model provides a heat abstractor of LRD UV photocuring equipment, the combination has utilized the fan, the heat pipe, heat radiation fins and semiconductor refrigeration piece, can adopt different heat dissipation grades according to photocuring equipment's real work demand respectively, consequently, can effectually dispel the heat to photocuring equipment, and c</description><language>chi ; eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170426&DB=EPODOC&CC=CN&NR=206122113U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170426&DB=EPODOC&CC=CN&NR=206122113U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>XU TAIYANG</creatorcontrib><title>Heat radiator for LEDUV photocuring equipment</title><description>The utility model discloses a heat radiator for LEDUV photocuring equipment, which comprises the components of a lampshade, the LED lamp is installed to the rear end of lamp shade, and the front end of lamp shade cup joints and install the copper sheathing, peg graft and install the heat pipe in the rear end of copper sheathing, and there is a connection piece rear end of copper sheathing through the screw connection, the rear end array of connection piece has the heat radiation fins who cup joints on the heat pipe, and the center department that the rear end of copper sheathing is lieing in heat radiation fins is provided with the fan, the utility model provides a heat abstractor of LRD UV photocuring equipment, the combination has utilized the fan, the heat pipe, heat radiation fins and semiconductor refrigeration piece, can adopt different heat dissipation grades according to photocuring equipment's real work demand respectively, consequently, can effectually dispel the heat to photocuring equipment, and c</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND1SE0sUShKTMlMLMkvUkgDYh9Xl9AwhYKM_JL85NKizLx0hdTC0syC3NS8Eh4G1rTEnOJUXijNzaDk5hri7KGbWpAfn1pckJicmpdaEu_sZ2RgZmhkZGhoHBpqTJQiAPKgKpU</recordid><startdate>20170426</startdate><enddate>20170426</enddate><creator>XU TAIYANG</creator><scope>EVB</scope></search><sort><creationdate>20170426</creationdate><title>Heat radiator for LEDUV photocuring equipment</title><author>XU TAIYANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN206122113UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>XU TAIYANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>XU TAIYANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Heat radiator for LEDUV photocuring equipment</title><date>2017-04-26</date><risdate>2017</risdate><abstract>The utility model discloses a heat radiator for LEDUV photocuring equipment, which comprises the components of a lampshade, the LED lamp is installed to the rear end of lamp shade, and the front end of lamp shade cup joints and install the copper sheathing, peg graft and install the heat pipe in the rear end of copper sheathing, and there is a connection piece rear end of copper sheathing through the screw connection, the rear end array of connection piece has the heat radiation fins who cup joints on the heat pipe, and the center department that the rear end of copper sheathing is lieing in heat radiation fins is provided with the fan, the utility model provides a heat abstractor of LRD UV photocuring equipment, the combination has utilized the fan, the heat pipe, heat radiation fins and semiconductor refrigeration piece, can adopt different heat dissipation grades according to photocuring equipment's real work demand respectively, consequently, can effectually dispel the heat to photocuring equipment, and c</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN206122113UU |
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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | Heat radiator for LEDUV photocuring equipment |
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