A negative pressure production platform for AOI device that PCB film detected
The utility model discloses a negative pressure production platform for AOI device that PCB film detected relates to the negative pressure and produces technical field. The negative pressure produces the platform and includes basic platform, supporting mechanism, negative pressure platform and negat...
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| creator | GUO LIANJIN LIANG ZHIPIAO LUO BINGJUN LEI FANG LIANG JIEHAO |
| description | The utility model discloses a negative pressure production platform for AOI device that PCB film detected relates to the negative pressure and produces technical field. The negative pressure produces the platform and includes basic platform, supporting mechanism, negative pressure platform and negative pressure production subassembly, the basic platform is located the bottom, and the negative pressure platform supports through the supporting mechanism that a plurality of is connected with the basic platform, and the negative pressure produces the subassembly and is connected with the negative pressure platform, the negative pressure produces the platform and is used for producing the power that adsorbs the negative pressure platform under the control of computer, is equipped with a plurality of aperture and film location identification on the negative pressure platform. The negative pressure is equipped with even fine and close aperture on producing the platform, by vacuum pump production negative pressure, through the action of solenoid valve control cylinder, makes vacuum straw work or stops to the messenger place film on the negative pressure platform hug closely it on and the skew does not take place, be favorable to film's accurate positioning. |
| format | Patent |
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The negative pressure produces the platform and includes basic platform, supporting mechanism, negative pressure platform and negative pressure production subassembly, the basic platform is located the bottom, and the negative pressure platform supports through the supporting mechanism that a plurality of is connected with the basic platform, and the negative pressure produces the subassembly and is connected with the negative pressure platform, the negative pressure produces the platform and is used for producing the power that adsorbs the negative pressure platform under the control of computer, is equipped with a plurality of aperture and film location identification on the negative pressure platform. The negative pressure is equipped with even fine and close aperture on producing the platform, by vacuum pump production negative pressure, through the action of solenoid valve control cylinder, makes vacuum straw work or stops to the messenger place film on the negative pressure platform hug closely it on and the skew does not take place, be favorable to film's accurate positioning.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151118&DB=EPODOC&CC=CN&NR=204790311U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151118&DB=EPODOC&CC=CN&NR=204790311U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GUO LIANJIN</creatorcontrib><creatorcontrib>LIANG ZHIPIAO</creatorcontrib><creatorcontrib>LUO BINGJUN</creatorcontrib><creatorcontrib>LEI FANG</creatorcontrib><creatorcontrib>LIANG JIEHAO</creatorcontrib><title>A negative pressure production platform for AOI device that PCB film detected</title><description>The utility model discloses a negative pressure production platform for AOI device that PCB film detected relates to the negative pressure and produces technical field. 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The negative pressure produces the platform and includes basic platform, supporting mechanism, negative pressure platform and negative pressure production subassembly, the basic platform is located the bottom, and the negative pressure platform supports through the supporting mechanism that a plurality of is connected with the basic platform, and the negative pressure produces the subassembly and is connected with the negative pressure platform, the negative pressure produces the platform and is used for producing the power that adsorbs the negative pressure platform under the control of computer, is equipped with a plurality of aperture and film location identification on the negative pressure platform. The negative pressure is equipped with even fine and close aperture on producing the platform, by vacuum pump production negative pressure, through the action of solenoid valve control cylinder, makes vacuum straw work or stops to the messenger place film on the negative pressure platform hug closely it on and the skew does not take place, be favorable to film's accurate positioning.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | A negative pressure production platform for AOI device that PCB film detected |
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