RF sputtering power in high-power
The utility model provides a RF sputtering power in high-power, air switch that connects including the order, resume protective tube, three-phase full-bridge rectifier circuit, filter capacitance, DCDC converter, DCAC converter soon, characterized in that: the DCDC converter is by chopper control ci...
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| creator | LI HONGZE DOU JIUCUN |
| description | The utility model provides a RF sputtering power in high-power, air switch that connects including the order, resume protective tube, three-phase full-bridge rectifier circuit, filter capacitance, DCDC converter, DCAC converter soon, characterized in that: the DCDC converter is by chopper control circuit control, the DCAC dc-to-ac converter is controlled by contravariant control circuit, the control end of switch tube is connected in chopper control circuit output and the DCDC converter, the control end of switch tube is connected in dc-to-ac converter control circuit's output and the DCAC dc-to-ac converter. Beneficial effect: increase to sputter the power the reliability, adopt above-mentioned power structure to reduce the power cost simultaneously, its dynamic characteristic is good. |
| format | Patent |
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Beneficial effect: increase to sputter the power the reliability, adopt above-mentioned power structure to reduce the power cost simultaneously, its dynamic characteristic is good.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150805&DB=EPODOC&CC=CN&NR=204529967U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150805&DB=EPODOC&CC=CN&NR=204529967U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LI HONGZE</creatorcontrib><creatorcontrib>DOU JIUCUN</creatorcontrib><title>RF sputtering power in high-power</title><description>The utility model provides a RF sputtering power in high-power, air switch that connects including the order, resume protective tube, three-phase full-bridge rectifier circuit, filter capacitance, DCDC converter, DCAC converter soon, characterized in that: the DCDC converter is by chopper control circuit control, the DCAC dc-to-ac converter is controlled by contravariant control circuit, the control end of switch tube is connected in chopper control circuit output and the DCDC converter, the control end of switch tube is connected in dc-to-ac converter control circuit's output and the DCAC dc-to-ac converter. Beneficial effect: increase to sputter the power the reliability, adopt above-mentioned power structure to reduce the power cost simultaneously, its dynamic characteristic is good.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAMclMoLigtKUktysxLVyjIL08tUsjMU8jITM_QBfN4GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8s5-RgYmpkaWlmXloqDFRigDBGCZf</recordid><startdate>20150805</startdate><enddate>20150805</enddate><creator>LI HONGZE</creator><creator>DOU JIUCUN</creator><scope>EVB</scope></search><sort><creationdate>20150805</creationdate><title>RF sputtering power in high-power</title><author>LI HONGZE ; DOU JIUCUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN204529967UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LI HONGZE</creatorcontrib><creatorcontrib>DOU JIUCUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LI HONGZE</au><au>DOU JIUCUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RF sputtering power in high-power</title><date>2015-08-05</date><risdate>2015</risdate><abstract>The utility model provides a RF sputtering power in high-power, air switch that connects including the order, resume protective tube, three-phase full-bridge rectifier circuit, filter capacitance, DCDC converter, DCAC converter soon, characterized in that: the DCDC converter is by chopper control circuit control, the DCAC dc-to-ac converter is controlled by contravariant control circuit, the control end of switch tube is connected in chopper control circuit output and the DCDC converter, the control end of switch tube is connected in dc-to-ac converter control circuit's output and the DCAC dc-to-ac converter. Beneficial effect: increase to sputter the power the reliability, adopt above-mentioned power structure to reduce the power cost simultaneously, its dynamic characteristic is good.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | RF sputtering power in high-power |
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