Four-dimensional EUV reflector adjustment device
The utility model discloses a four-dimensional EUV reflector adjustment device which includes a vacuum cavity, a reflector, a lens support frame, a slide system, first adjustment systems and a second adjustment system. The reflector is in the vacuum cavity. The reflector is installed on the lens sup...
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| creator | CHEN JINXIN WANG KUIBO WU XIAOBIN WANG YU CUI HUIRONG XIE WANLU |
| description | The utility model discloses a four-dimensional EUV reflector adjustment device which includes a vacuum cavity, a reflector, a lens support frame, a slide system, first adjustment systems and a second adjustment system. The reflector is in the vacuum cavity. The reflector is installed on the lens support frame. The slide system includes a slide channel and a slide body. The slide body is arranged on the slide channel and capable of sliding on the slide channel. The bottom of the lens support frame is provided with a ball socket so that the lens support frame is assembled on the slide system through cooperation of the ball socket and the slide body. The first adjustment systems extend into the vacuum cavity from outside the vacuum cavity and abut against the lens support frame so that the lens support frame rotates around three axes which pass through the center of the slide body and are vertical to each other in a pairwise manner. The second adjustment system extends into the vacuum cavity from outside the vacuum cavity and abuts against the slide body so that the slide body slides along the slide channel. The four-dimensional EUV reflector adjustment device is capable of realizing adjustment of one-dimension translation and three-dimension rotation of the reflector and the lens support frame. |
| format | Patent |
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The reflector is in the vacuum cavity. The reflector is installed on the lens support frame. The slide system includes a slide channel and a slide body. The slide body is arranged on the slide channel and capable of sliding on the slide channel. The bottom of the lens support frame is provided with a ball socket so that the lens support frame is assembled on the slide system through cooperation of the ball socket and the slide body. The first adjustment systems extend into the vacuum cavity from outside the vacuum cavity and abut against the lens support frame so that the lens support frame rotates around three axes which pass through the center of the slide body and are vertical to each other in a pairwise manner. The second adjustment system extends into the vacuum cavity from outside the vacuum cavity and abuts against the slide body so that the slide body slides along the slide channel. The four-dimensional EUV reflector adjustment device is capable of realizing adjustment of one-dimension translation and three-dimension rotation of the reflector and the lens support frame.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150114&DB=EPODOC&CC=CN&NR=204101796U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150114&DB=EPODOC&CC=CN&NR=204101796U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEN JINXIN</creatorcontrib><creatorcontrib>WANG KUIBO</creatorcontrib><creatorcontrib>WU XIAOBIN</creatorcontrib><creatorcontrib>WANG YU</creatorcontrib><creatorcontrib>CUI HUIRONG</creatorcontrib><creatorcontrib>XIE WANLU</creatorcontrib><title>Four-dimensional EUV reflector adjustment device</title><description>The utility model discloses a four-dimensional EUV reflector adjustment device which includes a vacuum cavity, a reflector, a lens support frame, a slide system, first adjustment systems and a second adjustment system. 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The four-dimensional EUV reflector adjustment device is capable of realizing adjustment of one-dimension translation and three-dimension rotation of the reflector and the lens support frame.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Four-dimensional EUV reflector adjustment device |
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