Magnetron sputtering chamber and vacuum coating equipment comprising same

The utility model provides a magnetron sputtering chamber and vacuum coating equipment comprising the same. The magnetron sputtering chamber comprises a vacuum chamber provided with a mounting hole, a magnetron sputtering target source provided with a target base, an insulating piece, an O-shaped ri...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WANG SHUHUI, LIU ZHUYANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The utility model provides a magnetron sputtering chamber and vacuum coating equipment comprising the same. The magnetron sputtering chamber comprises a vacuum chamber provided with a mounting hole, a magnetron sputtering target source provided with a target base, an insulating piece, an O-shaped ring, an insulating plate and a locking nut, wherein the target base is pressed against the inner wall of the mounting hole through the insulating piece and the O-shaped ring and is fixedly sealed through the insulating plate arranged on the outer wall of the mounting hole and the locking nut. The magnetron sputtering chamber provided by the utility model has the advantages of high sealing insulativity and simple sealing structure.