Polycrystalline silicon waste gas elution system
The utility model provides a polycrystalline silicon waste gas elution system. The polycrystalline silicon waste gas elution system comprises a first elution tower, a second elution tower, a first leacheate circulation tank, a second leacheate circulation tank, a waste residue blocking part, a first...
Gespeichert in:
| Hauptverfasser: | , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TANG JINRUI HAN JINGUO ZHANG HUA DING BINGHENG DENG LIANG YU ZHONGWEI SHEN ZONGXI YANG JIE |
| description | The utility model provides a polycrystalline silicon waste gas elution system. The polycrystalline silicon waste gas elution system comprises a first elution tower, a second elution tower, a first leacheate circulation tank, a second leacheate circulation tank, a waste residue blocking part, a first circulating pump and a second circulating pump, wherein the first elution tower is used for eluting polycrystalline silicon waste gas by leacheate; the second elution tower is used for eluting polycrystalline silicon waste gas by the leacheate; the first leacheate circulation tank is used for receiving the leacheate from the first elution tower and the second elution tower; the second leacheate circulation tank is used for receiving the leacheate from the first leacheate circulation tank; the waste residue stopping part is used for stopping waste residues from entering the second leacheate circulation tank from the first leacheate circulation tank; the first circulating pump is used for introducing the leacheate i |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN203061051UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN203061051UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN203061051UU3</originalsourceid><addsrcrecordid>eNrjZDAIyM-pTC6qLC5JzMnJzEtVKM7MyUzOz1MoTywuSVVITyxWSM0pLckEihQDFaXm8jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeGc_IwNjAzNDA1PD0FBjohQBAA7nLLI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Polycrystalline silicon waste gas elution system</title><source>esp@cenet</source><creator>TANG JINRUI ; HAN JINGUO ; ZHANG HUA ; DING BINGHENG ; DENG LIANG ; YU ZHONGWEI ; SHEN ZONGXI ; YANG JIE</creator><creatorcontrib>TANG JINRUI ; HAN JINGUO ; ZHANG HUA ; DING BINGHENG ; DENG LIANG ; YU ZHONGWEI ; SHEN ZONGXI ; YANG JIE</creatorcontrib><description>The utility model provides a polycrystalline silicon waste gas elution system. The polycrystalline silicon waste gas elution system comprises a first elution tower, a second elution tower, a first leacheate circulation tank, a second leacheate circulation tank, a waste residue blocking part, a first circulating pump and a second circulating pump, wherein the first elution tower is used for eluting polycrystalline silicon waste gas by leacheate; the second elution tower is used for eluting polycrystalline silicon waste gas by the leacheate; the first leacheate circulation tank is used for receiving the leacheate from the first elution tower and the second elution tower; the second leacheate circulation tank is used for receiving the leacheate from the first leacheate circulation tank; the waste residue stopping part is used for stopping waste residues from entering the second leacheate circulation tank from the first leacheate circulation tank; the first circulating pump is used for introducing the leacheate i</description><language>chi ; eng</language><subject>PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TRANSPORTING</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130717&DB=EPODOC&CC=CN&NR=203061051U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130717&DB=EPODOC&CC=CN&NR=203061051U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANG JINRUI</creatorcontrib><creatorcontrib>HAN JINGUO</creatorcontrib><creatorcontrib>ZHANG HUA</creatorcontrib><creatorcontrib>DING BINGHENG</creatorcontrib><creatorcontrib>DENG LIANG</creatorcontrib><creatorcontrib>YU ZHONGWEI</creatorcontrib><creatorcontrib>SHEN ZONGXI</creatorcontrib><creatorcontrib>YANG JIE</creatorcontrib><title>Polycrystalline silicon waste gas elution system</title><description>The utility model provides a polycrystalline silicon waste gas elution system. The polycrystalline silicon waste gas elution system comprises a first elution tower, a second elution tower, a first leacheate circulation tank, a second leacheate circulation tank, a waste residue blocking part, a first circulating pump and a second circulating pump, wherein the first elution tower is used for eluting polycrystalline silicon waste gas by leacheate; the second elution tower is used for eluting polycrystalline silicon waste gas by the leacheate; the first leacheate circulation tank is used for receiving the leacheate from the first elution tower and the second elution tower; the second leacheate circulation tank is used for receiving the leacheate from the first leacheate circulation tank; the waste residue stopping part is used for stopping waste residues from entering the second leacheate circulation tank from the first leacheate circulation tank; the first circulating pump is used for introducing the leacheate i</description><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAIyM-pTC6qLC5JzMnJzEtVKM7MyUzOz1MoTywuSVVITyxWSM0pLckEihQDFaXm8jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeGc_IwNjAzNDA1PD0FBjohQBAA7nLLI</recordid><startdate>20130717</startdate><enddate>20130717</enddate><creator>TANG JINRUI</creator><creator>HAN JINGUO</creator><creator>ZHANG HUA</creator><creator>DING BINGHENG</creator><creator>DENG LIANG</creator><creator>YU ZHONGWEI</creator><creator>SHEN ZONGXI</creator><creator>YANG JIE</creator><scope>EVB</scope></search><sort><creationdate>20130717</creationdate><title>Polycrystalline silicon waste gas elution system</title><author>TANG JINRUI ; HAN JINGUO ; ZHANG HUA ; DING BINGHENG ; DENG LIANG ; YU ZHONGWEI ; SHEN ZONGXI ; YANG JIE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN203061051UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2013</creationdate><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TANG JINRUI</creatorcontrib><creatorcontrib>HAN JINGUO</creatorcontrib><creatorcontrib>ZHANG HUA</creatorcontrib><creatorcontrib>DING BINGHENG</creatorcontrib><creatorcontrib>DENG LIANG</creatorcontrib><creatorcontrib>YU ZHONGWEI</creatorcontrib><creatorcontrib>SHEN ZONGXI</creatorcontrib><creatorcontrib>YANG JIE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANG JINRUI</au><au>HAN JINGUO</au><au>ZHANG HUA</au><au>DING BINGHENG</au><au>DENG LIANG</au><au>YU ZHONGWEI</au><au>SHEN ZONGXI</au><au>YANG JIE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polycrystalline silicon waste gas elution system</title><date>2013-07-17</date><risdate>2013</risdate><abstract>The utility model provides a polycrystalline silicon waste gas elution system. The polycrystalline silicon waste gas elution system comprises a first elution tower, a second elution tower, a first leacheate circulation tank, a second leacheate circulation tank, a waste residue blocking part, a first circulating pump and a second circulating pump, wherein the first elution tower is used for eluting polycrystalline silicon waste gas by leacheate; the second elution tower is used for eluting polycrystalline silicon waste gas by the leacheate; the first leacheate circulation tank is used for receiving the leacheate from the first elution tower and the second elution tower; the second leacheate circulation tank is used for receiving the leacheate from the first leacheate circulation tank; the waste residue stopping part is used for stopping waste residues from entering the second leacheate circulation tank from the first leacheate circulation tank; the first circulating pump is used for introducing the leacheate i</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN203061051UU |
| source | esp@cenet |
| subjects | PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING |
| title | Polycrystalline silicon waste gas elution system |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T01%3A37%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TANG%20JINRUI&rft.date=2013-07-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN203061051UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |