Circulating water system for tail gas treatment device
The utility model discloses a circulating water system for a tail gas treatment device, which comprises an exhaust input pipeline, a thermal incineration chamber, a water bath chamber and a plasma treatment device. The water bath chamber comprises a water bath respectively provided with a liquid inl...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses a circulating water system for a tail gas treatment device, which comprises an exhaust input pipeline, a thermal incineration chamber, a water bath chamber and a plasma treatment device. The water bath chamber comprises a water bath respectively provided with a liquid inlet and a liquid outlet, the water bath is divided into a liquid inlet zone, at least one deposition zone and a liquid outlet zone along the flow direction of liquid by baffle plates, U-shaped depositors are arranged at the bottoms of the liquid inlet zone and the deposition zones, a blowdown valve is hermetically mounted at the bottom of each U-shaped depositor, the liquid inlet of the water bath faces the liquid inlet zone, the lower ends of the baffle plates are fixed to the bottom of the water bath, the upper ends of the baffle plates are movably arranged, the lengths of the baffle plates are increased one by one along the flow direction of the liquid, and filter holes are arranged on surfaces of the baffle plat |
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