Infant garment with exposed mark

Infant garment with exposed mark

The utility model provides an infant garment with an exposed mark, and relates to the technical field of infant garments. The infant garment comprises a garment body and a mark, wherein the mark is arranged at the outer side of the garment body. By arranging the mark at the outer side of the garment...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: LI CHUNCHAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
ACCESSORIES
HUMAN NECESSITIES
OUTERWEAR
PROTECTIVE GARMENTS
WEARING APPAREL
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator LI CHUNCHAN
description The utility model provides an infant garment with an exposed mark, and relates to the technical field of infant garments. The infant garment comprises a garment body and a mark, wherein the mark is arranged at the outer side of the garment body. By arranging the mark at the outer side of the garment, the mark is not contacted with skin of an infant no longer, so as to enable the infant to feel more comfortable when wearing the garment.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN201878797UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN201878797UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN201878797UU3</originalsourceid><addsrcrecordid>eNrjZFDwzEtLzCtRSE8syk0F0uWZJRkKqRUF-cWpKQq5iUXZPAysaYk5xam8UJqbQcnNNcTZQze1ID8-tbggMTk1L7Uk3tnPyMDQwtzC3NI8NNSYKEUAoqQmKg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Infant garment with exposed mark</title><source>esp@cenet</source><creator>LI CHUNCHAN</creator><creatorcontrib>LI CHUNCHAN</creatorcontrib><description>The utility model provides an infant garment with an exposed mark, and relates to the technical field of infant garments. The infant garment comprises a garment body and a mark, wherein the mark is arranged at the outer side of the garment body. By arranging the mark at the outer side of the garment, the mark is not contacted with skin of an infant no longer, so as to enable the infant to feel more comfortable when wearing the garment.</description><language>chi ; eng</language><subject>ACCESSORIES ; HUMAN NECESSITIES ; OUTERWEAR ; PROTECTIVE GARMENTS ; WEARING APPAREL</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110629&amp;DB=EPODOC&amp;CC=CN&amp;NR=201878797U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110629&amp;DB=EPODOC&amp;CC=CN&amp;NR=201878797U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LI CHUNCHAN</creatorcontrib><title>Infant garment with exposed mark</title><description>The utility model provides an infant garment with an exposed mark, and relates to the technical field of infant garments. The infant garment comprises a garment body and a mark, wherein the mark is arranged at the outer side of the garment body. By arranging the mark at the outer side of the garment, the mark is not contacted with skin of an infant no longer, so as to enable the infant to feel more comfortable when wearing the garment.</description><subject>ACCESSORIES</subject><subject>HUMAN NECESSITIES</subject><subject>OUTERWEAR</subject><subject>PROTECTIVE GARMENTS</subject><subject>WEARING APPAREL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDwzEtLzCtRSE8syk0F0uWZJRkKqRUF-cWpKQq5iUXZPAysaYk5xam8UJqbQcnNNcTZQze1ID8-tbggMTk1L7Uk3tnPyMDQwtzC3NI8NNSYKEUAoqQmKg</recordid><startdate>20110629</startdate><enddate>20110629</enddate><creator>LI CHUNCHAN</creator><scope>EVB</scope></search><sort><creationdate>20110629</creationdate><title>Infant garment with exposed mark</title><author>LI CHUNCHAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN201878797UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2011</creationdate><topic>ACCESSORIES</topic><topic>HUMAN NECESSITIES</topic><topic>OUTERWEAR</topic><topic>PROTECTIVE GARMENTS</topic><topic>WEARING APPAREL</topic><toplevel>online_resources</toplevel><creatorcontrib>LI CHUNCHAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LI CHUNCHAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Infant garment with exposed mark</title><date>2011-06-29</date><risdate>2011</risdate><abstract>The utility model provides an infant garment with an exposed mark, and relates to the technical field of infant garments. The infant garment comprises a garment body and a mark, wherein the mark is arranged at the outer side of the garment body. By arranging the mark at the outer side of the garment, the mark is not contacted with skin of an infant no longer, so as to enable the infant to feel more comfortable when wearing the garment.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN201878797UU
source esp@cenet
subjects ACCESSORIES
HUMAN NECESSITIES
OUTERWEAR
PROTECTIVE GARMENTS
WEARING APPAREL
title Infant garment with exposed mark
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T19%3A20%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LI%20CHUNCHAN&rft.date=2011-06-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN201878797UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true