Method for fabricating capacitor in semiconductor device

A method for fabricating a capacitor in a semiconductor device is provided. The method includes forming an insulation layer over a substrate; flushing a metal source onto the insulation layer to change a characteristic of a surface of the insulation layer to improve adherence of a metal-based materi...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	YEOM SEUNG-JIN,KIL DEOK-SIN,KIM JIN-HYOCK,PARK KI-SEON,SONG HAN-SANG,ROH JAE-SUNG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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