Lithographic glue composition

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1. Verfasser: KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI
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creator KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN1975575A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN1975575A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN1975575A3</originalsourceid><addsrcrecordid>eNrjZJD1ySzJyE8vSizIyExWSM8pTVVIzs8tyC_OLMnMz-NhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfHOfoaW5qam5qaOxoRVAABqXCPN</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic glue composition</title><source>esp@cenet</source><creator>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</creator><creatorcontrib>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</creatorcontrib><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070606&amp;DB=EPODOC&amp;CC=CN&amp;NR=1975575A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070606&amp;DB=EPODOC&amp;CC=CN&amp;NR=1975575A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</creatorcontrib><title>Lithographic glue composition</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJD1ySzJyE8vSizIyExWSM8pTVVIzs8tyC_OLMnMz-NhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfHOfoaW5qam5qaOxoRVAABqXCPN</recordid><startdate>20070606</startdate><enddate>20070606</enddate><creator>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</creator><scope>EVB</scope></search><sort><creationdate>20070606</creationdate><title>Lithographic glue composition</title><author>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1975575A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM BYEONG-UK,KIM DONG-MIN,PARK DAE-YON,KIM CHOO-HYEK,CHOI GEEI,KIM CHONG-WAN,LEE GI-BEAM,BYON CHAEL-GEE,KIM MOONI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic glue composition</title><date>2007-06-06</date><risdate>2007</risdate><oa>free_for_read</oa></addata></record>
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recordid cdi_epo_espacenet_CN1975575A
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Lithographic glue composition
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T15%3A42%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KIM%20BYEONG-UK,KIM%20DONG-MIN,PARK%20DAE-YON,KIM%20CHOO-HYEK,CHOI%20GEEI,KIM%20CHONG-WAN,LEE%20GI-BEAM,BYON%20CHAEL-GEE,KIM%20MOONI&rft.date=2007-06-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN1975575A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true