Method of forming a nanoporous dielectric film

A method comprising forming a coating solution which comprises a matrix precursor material, a porogen material and a solvent, by selecting a polyarylene matrix precursor material which cross-links to form a matrix with a calculated cross-link moeity density of at least 0.003 moles/ml, and reacting t...

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Bibliographische Detailangaben
1. Verfasser: NIU J. Q.,HAHNFELD J. L.,LYONS J. W.,SEDON J. H.,SILVIS C. H
Format: Patent
Sprache:eng
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