Methods of forming electrical connections for semiconductor constructions

The invention includes methods for forming electrical connections associated with semiconductor constructions. A semiconductor substrate is provided which has a conductive line thereover, and which has at least two diffusion regions adjacent the conductive line. A patterned etch stop is formed over...

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Bibliographische Detailangaben
1. Verfasser: TRAN LUAN C.,FISHBURN FRED D
Format: Patent
Sprache:eng
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