System and method for compensating selective optical graph
A method for compensating optical pattern selectively includes confirming the first contact region and confirming whether the first optical compensation is applied on the first contact region or not according to correlation information of the first contact region, applying the first optical compensa...
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| description | A method for compensating optical pattern selectively includes confirming the first contact region and confirming whether the first optical compensation is applied on the first contact region or not according to correlation information of the first contact region, applying the first optical compensation on the first contact region and confirming the first distance between the first optical compensation and the second one as well as processing correlation information of the first distance then regulating the first optical compensation based on relative information of the first distance if it is. |
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BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070404&DB=EPODOC&CC=CN&NR=1940714A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070404&DB=EPODOC&CC=CN&NR=1940714A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GUIQI GUO</creatorcontrib><title>System and method for compensating selective optical graph</title><description>A method for compensating optical pattern selectively includes confirming the first contact region and confirming whether the first optical compensation is applied on the first contact region or not according to correlation information of the first contact region, applying the first optical compensation on the first contact region and confirming the first distance between the first optical compensation and the second one as well as processing correlation information of the first distance then regulating the first optical compensation based on relative information of the first distance if it is.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAKriwuSc1VSMxLUchNLcnIT1FIyy9SSM7PLUjNK04sycxLVyhOzUlNLsksS1XILyjJTE7MUUgvSizI4GFgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8c5-hpYmBuaGJo7GhFUAANxdLns</recordid><startdate>20070404</startdate><enddate>20070404</enddate><creator>GUIQI GUO</creator><scope>EVB</scope></search><sort><creationdate>20070404</creationdate><title>System and method for compensating selective optical graph</title><author>GUIQI GUO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1940714A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>GUIQI GUO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GUIQI GUO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>System and method for compensating selective optical graph</title><date>2007-04-04</date><risdate>2007</risdate><abstract>A method for compensating optical pattern selectively includes confirming the first contact region and confirming whether the first optical compensation is applied on the first contact region or not according to correlation information of the first contact region, applying the first optical compensation on the first contact region and confirming the first distance between the first optical compensation and the second one as well as processing correlation information of the first distance then regulating the first optical compensation based on relative information of the first distance if it is.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | System and method for compensating selective optical graph |
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