Method and apparatus for angular-resolved spectroscopic lithography characterisation

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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1. Verfasser:	DEN BOEF ARIE JEFFREY,BLEEKER ARNO JAN,VAN DOMMELEN YOURI JOHANNES LA,DUSA MIRCEA,KIERS ANTOINE GASTON MARIE,LUEHRMANN PAUL FRANK,PELLEMANS HENRICUS PETRUS MARI,VAN DER SOHAAR MAURITS,GROUWSTRA CEDRIC
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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