Composition for microstructured screens
A composition having at least about 10 percent perfluoroalkylsulfonamideoethyl acrylate; at least about 5 percent aliphatic urethane acrylate oligomer; at least about 1 percent acrylate monomer; and less than about 84 percent other reactive and non-reactive components. The composition, with the addi...
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| creator | OLOFSON PETER M.,THOMAS PATRICK A.,GATES AMY J.,MOORE GEORGE G. I.,SAVU PATRICIA M |
| description | A composition having at least about 10 percent perfluoroalkylsulfonamideoethyl acrylate; at least about 5 percent aliphatic urethane acrylate oligomer; at least about 1 percent acrylate monomer; and less than about 84 percent other reactive and non-reactive components. The composition, with the addiction of a light absorbing pigment, is particularly useful as a light absorbing adhesive in an optical element such as a rear projection screen that incorporates totally internally reflecting structures to disperse the light passing through the screen. |
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The composition, with the addiction of a light absorbing pigment, is particularly useful as a light absorbing adhesive in an optical element such as a rear projection screen that incorporates totally internally reflecting structures to disperse the light passing through the screen.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ; ADHESIVES ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; DYES ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PHOTOGRAPHY ; PHYSICS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS AS ADHESIVES</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070110&DB=EPODOC&CC=CN&NR=1894599A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070110&DB=EPODOC&CC=CN&NR=1894599A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OLOFSON PETER M.,THOMAS PATRICK A.,GATES AMY J.,MOORE GEORGE G. 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I.,SAVU PATRICIA M</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OLOFSON PETER M.,THOMAS PATRICK A.,GATES AMY J.,MOORE GEORGE G. I.,SAVU PATRICIA M</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Composition for microstructured screens</title><date>2007-01-10</date><risdate>2007</risdate><abstract>A composition having at least about 10 percent perfluoroalkylsulfonamideoethyl acrylate; at least about 5 percent aliphatic urethane acrylate oligomer; at least about 1 percent acrylate monomer; and less than about 84 percent other reactive and non-reactive components. 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| subjects | ACCESSORIES THEREFOR ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DYES ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PHOTOGRAPHY PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES |
| title | Composition for microstructured screens |
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