Lithographic apparatus immersion damage control
A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system (LS) t...
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| creator | VAN DER MEULEN FRITS,COX HENRIKUS HERMAN MARIE,HOUKES MARTIJN,VAN VLIET ROBERTUS JOHANNES,NIHTIANOVSTOYAN,KEMPER PETRUS WILHELMUS JOSEPH,HANEGRAAF ROLAND PETRUS HENDRI |
| description | A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system (LS) to supply an immersion fluid (IML) in a space between a downstream lens of the projection system and the substrate (W) and a leakage detection system (LDC) to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system being constructed to detect leakage by measuring an electrical capacitance between two mutually isolated electrial conductors (COND1,COND2). |
| format | Patent |
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a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system (LS) to supply an immersion fluid (IML) in a space between a downstream lens of the projection system and the substrate (W) and a leakage detection system (LDC) to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system being constructed to detect leakage by measuring an electrical capacitance between two mutually isolated electrial conductors (COND1,COND2).</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND3ySzJyE8vSizIyExWSCwoSCxKLCktVsjMzU0tKs7Mz1NIScxNTE9VSM7PKynKz-FhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfHOfoYWlkYmxqaOxoRVAADHgCq0</recordid><startdate>20070110</startdate><enddate>20070110</enddate><creator>VAN DER MEULEN FRITS,COX HENRIKUS HERMAN MARIE,HOUKES MARTIJN,VAN VLIET ROBERTUS JOHANNES,NIHTIANOVSTOYAN,KEMPER PETRUS WILHELMUS JOSEPH,HANEGRAAF ROLAND PETRUS HENDRI</creator><scope>EVB</scope></search><sort><creationdate>20070110</creationdate><title>Lithographic apparatus immersion damage control</title><author>VAN DER MEULEN FRITS,COX HENRIKUS HERMAN MARIE,HOUKES MARTIJN,VAN VLIET ROBERTUS JOHANNES,NIHTIANOVSTOYAN,KEMPER PETRUS WILHELMUS JOSEPH,HANEGRAAF ROLAND PETRUS HENDRI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1892435A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DER MEULEN FRITS,COX HENRIKUS HERMAN MARIE,HOUKES MARTIJN,VAN VLIET ROBERTUS JOHANNES,NIHTIANOVSTOYAN,KEMPER PETRUS WILHELMUS JOSEPH,HANEGRAAF ROLAND PETRUS HENDRI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DER MEULEN FRITS,COX HENRIKUS HERMAN MARIE,HOUKES MARTIJN,VAN VLIET ROBERTUS JOHANNES,NIHTIANOVSTOYAN,KEMPER PETRUS WILHELMUS JOSEPH,HANEGRAAF ROLAND PETRUS HENDRI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus immersion damage control</title><date>2007-01-10</date><risdate>2007</risdate><abstract>A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system (LS) to supply an immersion fluid (IML) in a space between a downstream lens of the projection system and the substrate (W) and a leakage detection system (LDC) to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system being constructed to detect leakage by measuring an electrical capacitance between two mutually isolated electrial conductors (COND1,COND2).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus immersion damage control |
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