Stabilization system for halogen-containing polymers

A method is disclosed for stabilizing a halogen-containing polymer wherein the method comprises adding to said polymer a thermally stabilizing amount of a mixture comprising at least one polyalkylene glycol and at least one metal salt of a strong acid selected from the group consisting of perchloric...

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1. Verfasser: KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN
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creator KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN
description A method is disclosed for stabilizing a halogen-containing polymer wherein the method comprises adding to said polymer a thermally stabilizing amount of a mixture comprising at least one polyalkylene glycol and at least one metal salt of a strong acid selected from the group consisting of perchloric acid, trifluoroacetic acid, trifluoromethanesulfonic acid, alkylsufuric acid, phosphotungstic acid, HPF6, HBF4, and HSbF6.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN1856535A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN1856535A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN1856535A3</originalsourceid><addsrcrecordid>eNrjZDAJLklMyszJrEosyczPUyiuLC5JzVVIyy9SyEjMyU9PzdNNzs8rSczMy8xLVyjIz6nMTS0q5mFgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8c5-hhamZqbGpo7GhFUAAN1eLNI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Stabilization system for halogen-containing polymers</title><source>esp@cenet</source><creator>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</creator><creatorcontrib>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</creatorcontrib><description>A method is disclosed for stabilizing a halogen-containing polymer wherein the method comprises adding to said polymer a thermally stabilizing amount of a mixture comprising at least one polyalkylene glycol and at least one metal salt of a strong acid selected from the group consisting of perchloric acid, trifluoroacetic acid, trifluoromethanesulfonic acid, alkylsufuric acid, phosphotungstic acid, HPF6, HBF4, and HSbF6.</description><language>eng</language><subject>CHEMISTRY ; COMPOSITIONS BASED THEREON ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20061101&amp;DB=EPODOC&amp;CC=CN&amp;NR=1856535A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20061101&amp;DB=EPODOC&amp;CC=CN&amp;NR=1856535A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</creatorcontrib><title>Stabilization system for halogen-containing polymers</title><description>A method is disclosed for stabilizing a halogen-containing polymer wherein the method comprises adding to said polymer a thermally stabilizing amount of a mixture comprising at least one polyalkylene glycol and at least one metal salt of a strong acid selected from the group consisting of perchloric acid, trifluoroacetic acid, trifluoromethanesulfonic acid, alkylsufuric acid, phosphotungstic acid, HPF6, HBF4, and HSbF6.</description><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJLklMyszJrEosyczPUyiuLC5JzVVIyy9SyEjMyU9PzdNNzs8rSczMy8xLVyjIz6nMTS0q5mFgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8c5-hhamZqbGpo7GhFUAAN1eLNI</recordid><startdate>20061101</startdate><enddate>20061101</enddate><creator>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</creator><scope>EVB</scope></search><sort><creationdate>20061101</creationdate><title>Stabilization system for halogen-containing polymers</title><author>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1856535A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KRAINER EDWARD,BACALOGLU RADU,SHAH MUKUND,FISCH MICHAEL H.,FRENKEL PETER,BAE KOOK JIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Stabilization system for halogen-containing polymers</title><date>2006-11-01</date><risdate>2006</risdate><abstract>A method is disclosed for stabilizing a halogen-containing polymer wherein the method comprises adding to said polymer a thermally stabilizing amount of a mixture comprising at least one polyalkylene glycol and at least one metal salt of a strong acid selected from the group consisting of perchloric acid, trifluoroacetic acid, trifluoromethanesulfonic acid, alkylsufuric acid, phosphotungstic acid, HPF6, HBF4, and HSbF6.</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMISTRY
COMPOSITIONS BASED THEREON
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
title Stabilization system for halogen-containing polymers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T20%3A55%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KRAINER%20EDWARD,BACALOGLU%20RADU,SHAH%20MUKUND,FISCH%20MICHAEL%20H.,FRENKEL%20PETER,BAE%20KOOK%20JIN&rft.date=2006-11-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN1856535A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true