Gas distribution supply device and gas distribution supply method for supplying air to chamber by gas supply equipment with flow control device

The present invention is for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q 1 /Q 2 accurately and quickly from a gas supply facility equipped with a flow controller into a chamber. With the present invention, a total quantity Q=Q 1 +Q 2 of gas while...

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Bibliographische Detailangaben
1. Verfasser:	SUGIYAMA KAZUHIKO,K.K.EDA NOBUKAZU,NISHINO KOJI,DOHI RYOSUKE,UENOYAMA TOYOMI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING PHYSICS PIPE-LINE SYSTEMS PIPE-LINES REGULATING SEMICONDUCTOR DEVICES STORING OF DISTRIBUTING GASES OR LIQUIDS SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES WEAPONS
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