Methods of manufacturing a capacitor and a semiconductor device

In methods of manufacturing a capacitor and a semiconductor device, a mold layer is formed on a substrate having a contact plug. The mold layer includes an opening exposing the contact plug. A conductive layer is formed on the contact plug, an inner sidewall of the opening and the mold layer. A phot...

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Bibliographische Detailangaben
1. Verfasser: SHIM WOO-SEOK,PARK YOUNG-WOOK,LEE JUNG-HYEON,YOONKWANG-SUB,KIM CHUL-HO,PARK TAE-JIN
Format: Patent
Sprache:eng
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