Apparatus and method for preventing backsputtering
The back sputtering preventing device is used in the yellow light irradiation process of panel or substrate to prevent the liquid dropping to the surface of the substrate or panel from back sputtering to the substrate or panel after being painted and sputtered to the periphery. The back sputtering w...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | SHITING ZENG YUZHENG ZHONG DINGRUI GUO |
| description | The back sputtering preventing device is used in the yellow light irradiation process of panel or substrate to prevent the liquid dropping to the surface of the substrate or panel from back sputtering to the substrate or panel after being painted and sputtered to the periphery. The back sputtering will cause faults in the pattern making process with yellow light irradiation and inferior product quality. The back sputtering preventing device includes mainly one rotating unit, at least one liquid spraying unit, one baffle encircling at least one part of the rotating unit and one roughening unit. The back sputtering preventing method is also revealed.
本发明是有关于一种防止回溅的装置，是用于面板或基板的黄光制作过程，以防止滴置于基板或面板表面的液体(例如显影液或光阻液)，经旋涂后，溅散于周缘后又回溅至基板或面板。因而引起图样或黄光制作过程的缺陷，造成产品的劣化。该防止回溅的装置主要包含：一旋转器，至少一液体喷洒单元，至少一围绕部分该旋转器的挡板，以及一粗糙化单元。而防止回溅的方法，在此也一并揭示。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN1549058A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN1549058A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN1549058A3</originalsourceid><addsrcrecordid>eNrjZDByLChILEosKS1WSMxLUchNLcnIT1FIyy9SKChKLUvNK8nMS1dISkzOLi4oLSlJLQJyeRhY0xJzilN5oTQ3g7yba4izh25qQX58anFBYnJqXmpJvLOfoamJpYGphaMxYRUATxcryQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus and method for preventing backsputtering</title><source>esp@cenet</source><creator>SHITING ZENG ; YUZHENG ZHONG ; DINGRUI GUO</creator><creatorcontrib>SHITING ZENG ; YUZHENG ZHONG ; DINGRUI GUO</creatorcontrib><description>The back sputtering preventing device is used in the yellow light irradiation process of panel or substrate to prevent the liquid dropping to the surface of the substrate or panel from back sputtering to the substrate or panel after being painted and sputtered to the periphery. The back sputtering will cause faults in the pattern making process with yellow light irradiation and inferior product quality. The back sputtering preventing device includes mainly one rotating unit, at least one liquid spraying unit, one baffle encircling at least one part of the rotating unit and one roughening unit. The back sputtering preventing method is also revealed.
本发明是有关于一种防止回溅的装置，是用于面板或基板的黄光制作过程，以防止滴置于基板或面板表面的液体(例如显影液或光阻液)，经旋涂后，溅散于周缘后又回溅至基板或面板。因而引起图样或黄光制作过程的缺陷，造成产品的劣化。该防止回溅的装置主要包含：一旋转器，至少一液体喷洒单元，至少一围绕部分该旋转器的挡板，以及一粗糙化单元。而防止回溅的方法，在此也一并揭示。</description><edition>7</edition><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20041124&DB=EPODOC&CC=CN&NR=1549058A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25553,76306</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20041124&DB=EPODOC&CC=CN&NR=1549058A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHITING ZENG</creatorcontrib><creatorcontrib>YUZHENG ZHONG</creatorcontrib><creatorcontrib>DINGRUI GUO</creatorcontrib><title>Apparatus and method for preventing backsputtering</title><description>The back sputtering preventing device is used in the yellow light irradiation process of panel or substrate to prevent the liquid dropping to the surface of the substrate or panel from back sputtering to the substrate or panel after being painted and sputtered to the periphery. The back sputtering will cause faults in the pattern making process with yellow light irradiation and inferior product quality. The back sputtering preventing device includes mainly one rotating unit, at least one liquid spraying unit, one baffle encircling at least one part of the rotating unit and one roughening unit. The back sputtering preventing method is also revealed.
本发明是有关于一种防止回溅的装置，是用于面板或基板的黄光制作过程，以防止滴置于基板或面板表面的液体(例如显影液或光阻液)，经旋涂后，溅散于周缘后又回溅至基板或面板。因而引起图样或黄光制作过程的缺陷，造成产品的劣化。该防止回溅的装置主要包含：一旋转器，至少一液体喷洒单元，至少一围绕部分该旋转器的挡板，以及一粗糙化单元。而防止回溅的方法，在此也一并揭示。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDByLChILEosKS1WSMxLUchNLcnIT1FIyy9SKChKLUvNK8nMS1dISkzOLi4oLSlJLQJyeRhY0xJzilN5oTQ3g7yba4izh25qQX58anFBYnJqXmpJvLOfoamJpYGphaMxYRUATxcryQ</recordid><startdate>20041124</startdate><enddate>20041124</enddate><creator>SHITING ZENG</creator><creator>YUZHENG ZHONG</creator><creator>DINGRUI GUO</creator><scope>EVB</scope></search><sort><creationdate>20041124</creationdate><title>Apparatus and method for preventing backsputtering</title><author>SHITING ZENG ; YUZHENG ZHONG ; DINGRUI GUO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1549058A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>SHITING ZENG</creatorcontrib><creatorcontrib>YUZHENG ZHONG</creatorcontrib><creatorcontrib>DINGRUI GUO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHITING ZENG</au><au>YUZHENG ZHONG</au><au>DINGRUI GUO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus and method for preventing backsputtering</title><date>2004-11-24</date><risdate>2004</risdate><abstract>The back sputtering preventing device is used in the yellow light irradiation process of panel or substrate to prevent the liquid dropping to the surface of the substrate or panel from back sputtering to the substrate or panel after being painted and sputtered to the periphery. The back sputtering will cause faults in the pattern making process with yellow light irradiation and inferior product quality. The back sputtering preventing device includes mainly one rotating unit, at least one liquid spraying unit, one baffle encircling at least one part of the rotating unit and one roughening unit. The back sputtering preventing method is also revealed.
本发明是有关于一种防止回溅的装置，是用于面板或基板的黄光制作过程，以防止滴置于基板或面板表面的液体(例如显影液或光阻液)，经旋涂后，溅散于周缘后又回溅至基板或面板。因而引起图样或黄光制作过程的缺陷，造成产品的劣化。该防止回溅的装置主要包含：一旋转器，至少一液体喷洒单元，至少一围绕部分该旋转器的挡板，以及一粗糙化单元。而防止回溅的方法，在此也一并揭示。</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN1549058A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | Apparatus and method for preventing backsputtering |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T09%3A14%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SHITING%20ZENG&rft.date=2004-11-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN1549058A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |