Focus spot monitoring in a lithographic projection apparatus

A lithographic projection apparatus and method of manufacturing devices using said apparatus is presented, wherein the apparatus comprises a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height ma...

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Hauptverfasser: VAN ZON ALEX, VAN RHEE TASJA, CASTENMILLER THOMAS JOSEPHUS M, BROERS MICHAEL, KOENEN WILLEM HERMAN GERTRUDA
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creator VAN ZON ALEX
VAN RHEE TASJA
CASTENMILLER THOMAS JOSEPHUS M
BROERS MICHAEL
KOENEN WILLEM HERMAN GERTRUDA
description A lithographic projection apparatus and method of manufacturing devices using said apparatus is presented, wherein the apparatus comprises a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor.According to the invention the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of said surface of said substrate and to detect any focus spots on said surface of said substrate using said raw height map. By subtracting the average die topology, focus spots can be located more accurately then before.
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language chi ; eng
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title Focus spot monitoring in a lithographic projection apparatus
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