Chemically amplifying positive radiation sensitive resin composition
在具有高敏感性和高分辨率的正型化学增强的辐射敏感性树脂组合物中(该组合物包含：用酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂和辐射时经光照产生酸的化合物)，在电路图案中孤立和密集图案的分辨率线宽的差值(其中孤立和密集图案混合)可以通过使用下述树脂组合物而减少，该树脂组合物包括：具有可使保护基断裂的25Kcal/mole或更高的活化能值(ΔE)的树脂作为酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂，以及作为产酸剂的辐射时经光照产生羧酸的化合物及辐射时经光照产生磺酸的化合物的混合物。 In a positive-working chemically amplified radiation se...
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| creator | RI TOKAN HAMADA TAKAHIRO MIYAZAKI SHINJI |
| description | 在具有高敏感性和高分辨率的正型化学增强的辐射敏感性树脂组合物中(该组合物包含：用酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂和辐射时经光照产生酸的化合物)，在电路图案中孤立和密集图案的分辨率线宽的差值(其中孤立和密集图案混合)可以通过使用下述树脂组合物而减少，该树脂组合物包括：具有可使保护基断裂的25Kcal/mole或更高的活化能值(ΔE)的树脂作为酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂，以及作为产酸剂的辐射时经光照产生羧酸的化合物及辐射时经光照产生磺酸的化合物的混合物。
In a positive-working chemically amplified radiation sensitive resin composition with high sensitivity and high resolution comprising an alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group and an acid generating compound upon irradiation with radiation, a difference of resolution line widths of isolated and dense patterns in a circuit pattern, in which an isolated pattern and a dense pattern are mixed, can be reduced by using a resin having activation energy ( DELTA E) to make the protecting group cleaved of 25 Kcal/mole or higher as the alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group, and a mixture of a compound generating a carboxylic acid upon irradiation with radiation and a compound generating a sulfonic acid upon irradiation with radiation as the acid generator. |
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In a positive-working chemically amplified radiation sensitive resin composition with high sensitivity and high resolution comprising an alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group and an acid generating compound upon irradiation with radiation, a difference of resolution line widths of isolated and dense patterns in a circuit pattern, in which an isolated pattern and a dense pattern are mixed, can be reduced by using a resin having activation energy ( DELTA E) to make the protecting group cleaved of 25 Kcal/mole or higher as the alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group, and a mixture of a compound generating a carboxylic acid upon irradiation with radiation and a compound generating a sulfonic acid upon irradiation with radiation as the acid generator.</description><edition>7</edition><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040225&DB=EPODOC&CC=CN&NR=1478220A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040225&DB=EPODOC&CC=CN&NR=1478220A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RI TOKAN</creatorcontrib><creatorcontrib>HAMADA TAKAHIRO</creatorcontrib><creatorcontrib>MIYAZAKI SHINJI</creatorcontrib><title>Chemically amplifying positive radiation sensitive resin composition</title><description>在具有高敏感性和高分辨率的正型化学增强的辐射敏感性树脂组合物中(该组合物包含：用酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂和辐射时经光照产生酸的化合物)，在电路图案中孤立和密集图案的分辨率线宽的差值(其中孤立和密集图案混合)可以通过使用下述树脂组合物而减少，该树脂组合物包括：具有可使保护基断裂的25Kcal/mole或更高的活化能值(ΔE)的树脂作为酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂，以及作为产酸剂的辐射时经光照产生羧酸的化合物及辐射时经光照产生磺酸的化合物的混合物。
In a positive-working chemically amplified radiation sensitive resin composition with high sensitivity and high resolution comprising an alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group and an acid generating compound upon irradiation with radiation, a difference of resolution line widths of isolated and dense patterns in a circuit pattern, in which an isolated pattern and a dense pattern are mixed, can be reduced by using a resin having activation energy ( DELTA E) to make the protecting group cleaved of 25 Kcal/mole or higher as the alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group, and a mixture of a compound generating a carboxylic acid upon irradiation with radiation and a compound generating a sulfonic acid upon irradiation with radiation as the acid generator.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxzkjNzUxOzMmpVEjMLcjJTKvMzEtXKMgvzizJLEtVKEpMyUwsyczPUyhOzYOJpRZn5ikk5-dCVOXn8TCwpiXmFKfyQmluBnk31xBnD93Ugvz41OKCxOTUvNSSeGc_QxNzCyMjA0djwioAcl4zHw</recordid><startdate>20040225</startdate><enddate>20040225</enddate><creator>RI TOKAN</creator><creator>HAMADA TAKAHIRO</creator><creator>MIYAZAKI SHINJI</creator><scope>EVB</scope></search><sort><creationdate>20040225</creationdate><title>Chemically amplifying positive radiation sensitive resin composition</title><author>RI TOKAN ; HAMADA TAKAHIRO ; MIYAZAKI SHINJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1478220A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>RI TOKAN</creatorcontrib><creatorcontrib>HAMADA TAKAHIRO</creatorcontrib><creatorcontrib>MIYAZAKI SHINJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RI TOKAN</au><au>HAMADA TAKAHIRO</au><au>MIYAZAKI SHINJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Chemically amplifying positive radiation sensitive resin composition</title><date>2004-02-25</date><risdate>2004</risdate><abstract>在具有高敏感性和高分辨率的正型化学增强的辐射敏感性树脂组合物中(该组合物包含：用酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂和辐射时经光照产生酸的化合物)，在电路图案中孤立和密集图案的分辨率线宽的差值(其中孤立和密集图案混合)可以通过使用下述树脂组合物而减少，该树脂组合物包括：具有可使保护基断裂的25Kcal/mole或更高的活化能值(ΔE)的树脂作为酸不稳定的保护基团保护的碱不溶性或碱微溶性树脂，以及作为产酸剂的辐射时经光照产生羧酸的化合物及辐射时经光照产生磺酸的化合物的混合物。
In a positive-working chemically amplified radiation sensitive resin composition with high sensitivity and high resolution comprising an alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group and an acid generating compound upon irradiation with radiation, a difference of resolution line widths of isolated and dense patterns in a circuit pattern, in which an isolated pattern and a dense pattern are mixed, can be reduced by using a resin having activation energy ( DELTA E) to make the protecting group cleaved of 25 Kcal/mole or higher as the alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group, and a mixture of a compound generating a carboxylic acid upon irradiation with radiation and a compound generating a sulfonic acid upon irradiation with radiation as the acid generator.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Chemically amplifying positive radiation sensitive resin composition |
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