Liquid spraying method for preventing drop relict
The present invention is the liquid spraying method and nozzle unit without residual liquid drop. Beside the main conveying pipe to the nozzle, buffering conveying pipe with fine hole is connected parallelly. During development spraying, liquid developer is supplied with both main conveying pipe and...
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| creator | QINGXIONG XU |
| description | The present invention is the liquid spraying method and nozzle unit without residual liquid drop. Beside the main conveying pipe to the nozzle, buffering conveying pipe with fine hole is connected parallelly. During development spraying, liquid developer is supplied with both main conveying pipe and buffering conveying pipe. When the spraying is to be finished, the main conveying pipe is shut down while the fine hole is further used to provide flow rate to make up the instantaneous resorption of the main conveying pipe until the liquid surface and the nozzle mouth are in the same level. Then, the buffering conveying pipe is shut down and the resorption controlling valve is opened to make liquid back into the nozzle. |
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During development spraying, liquid developer is supplied with both main conveying pipe and buffering conveying pipe. When the spraying is to be finished, the main conveying pipe is shut down while the fine hole is further used to provide flow rate to make up the instantaneous resorption of the main conveying pipe until the liquid surface and the nozzle mouth are in the same level. Then, the buffering conveying pipe is shut down and the resorption controlling valve is opened to make liquid back into the nozzle.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031015&DB=EPODOC&CC=CN&NR=1448798A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031015&DB=EPODOC&CC=CN&NR=1448798A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>QINGXIONG XU</creatorcontrib><title>Liquid spraying method for preventing drop relict</title><description>The present invention is the liquid spraying method and nozzle unit without residual liquid drop. Beside the main conveying pipe to the nozzle, buffering conveying pipe with fine hole is connected parallelly. During development spraying, liquid developer is supplied with both main conveying pipe and buffering conveying pipe. When the spraying is to be finished, the main conveying pipe is shut down while the fine hole is further used to provide flow rate to make up the instantaneous resorption of the main conveying pipe until the liquid surface and the nozzle mouth are in the same level. Then, the buffering conveying pipe is shut down and the resorption controlling valve is opened to make liquid back into the nozzle.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD0ySwszUxRKC4oSqzMzEtXyE0tychPUUjLL1IoKEotS80rAYmmFOUXKBSl5mQml_AwsKYl5hSn8kJpbgZ5N9cQZw_d1IL8-NTigsTk1LzUknhnP0MTEwtzSwtHY8IqAA0LKz0</recordid><startdate>20031015</startdate><enddate>20031015</enddate><creator>QINGXIONG XU</creator><scope>EVB</scope></search><sort><creationdate>20031015</creationdate><title>Liquid spraying method for preventing drop relict</title><author>QINGXIONG XU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1448798A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>QINGXIONG XU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>QINGXIONG XU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Liquid spraying method for preventing drop relict</title><date>2003-10-15</date><risdate>2003</risdate><abstract>The present invention is the liquid spraying method and nozzle unit without residual liquid drop. Beside the main conveying pipe to the nozzle, buffering conveying pipe with fine hole is connected parallelly. During development spraying, liquid developer is supplied with both main conveying pipe and buffering conveying pipe. When the spraying is to be finished, the main conveying pipe is shut down while the fine hole is further used to provide flow rate to make up the instantaneous resorption of the main conveying pipe until the liquid surface and the nozzle mouth are in the same level. Then, the buffering conveying pipe is shut down and the resorption controlling valve is opened to make liquid back into the nozzle.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Liquid spraying method for preventing drop relict |
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