Method for producing semiconductor memory component

The invention relates to a method for fabricating a semiconductor memory component, in particular a DRAM or FeRAM having a silicon substrate. The lower electrode of a storage capacitor is insulated from the silicon substrate by a barrier layer. The barrier layer is patterned using a hard mask, in pa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: F. KREUPL, V. WEINRICH, M. ENGELHARDT
Format: Patent
Sprache:eng
Schlagworte:
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