An optical grid structure, method for producing the optical grid structure, an evanescence field sensor plate, a microtitre plate

An optical grid structure, method for producing the optical grid structure, an evanescence field sensor plate, a microtitre plate

Production of a grid structure comprises covering a surface section of a substrate with a photo lacquer layer (10); arranging the surface section in the near field of a phase mask (14) which has been structured according to a laser two beam interference method; irradiating the phase mask under the L...

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1. Verfasser: B. MAISENHEDER,J. EDLINGER,C. HEINE
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Sprache:eng
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INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TESTING
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creator B. MAISENHEDER,J. EDLINGER,C. HEINE
description Production of a grid structure comprises covering a surface section of a substrate with a photo lacquer layer (10); arranging the surface section in the near field of a phase mask (14) which has been structured according to a laser two beam interference method; irradiating the phase mask under the Littrow angle (theta L) or not more than 5 [deg]; developing the lacquer; etching the surface section to form the grid structure and removing the photo lacquer layer. Preferred Features: The phase mask is a transparent substrate and comprises a structured layer which the grid structure optically inactivates. The structured layer is made of a chrome layer.
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TESTING
title An optical grid structure, method for producing the optical grid structure, an evanescence field sensor plate, a microtitre plate
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