Film thickness analysis method

The invention provides a film thickness analysis method which comprises the following steps: calculating the measured reflectivity of a to-be-measured sample according to the measured light intensity of the to-be-measured sample; matching the measured reflectivity with the theoretical reflectivity i...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GUO CHUNFU, ZHANG CHENGHAO, LI WEIQI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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