Apparatus for manufacturing display apparatus and method of manufacturing display apparatus

Disclosed are an apparatus for manufacturing a display apparatus and a method of manufacturing a display apparatus, the apparatus including: a mask assembly facing a display substrate; and a deposition source facing the mask assembly on a side of the mask assembly opposite the display substrate. The...

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Bibliographische Detailangaben
Hauptverfasser: LEE SANG-SHIN, JEON SANGHEON, LEE SEUNGJIN, SONG MINUL, KIM SE-IL
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Disclosed are an apparatus for manufacturing a display apparatus and a method of manufacturing a display apparatus, the apparatus including: a mask assembly facing a display substrate; and a deposition source facing the mask assembly on a side of the mask assembly opposite the display substrate. The mask assembly includes: a mask frame having an open region; a first mask on the mask frame and having a first opening; and a second mask on the first mask and having a plurality of second openings overlapping the first openings in a plan view and positioned within an outer periphery of the first openings. A corner curvature radius of each of the second openings is 6 [mu] m or less. 公开了用于制造显示设备的设备以及制造显示设备的方法,所述设备包括:掩模组件,面向显示衬底;以及沉积源,在掩模组件的与显示衬底相对的侧上面向掩模组件。掩模组件包括:掩模框架,具有开口区域;第一掩模,在掩模框架上并且具有第一开口;以及第二掩模,在第一掩模上,并且具有在平面图中与第一开口重叠并且定位在第一开口的外周内的多个第二开口。第二开口中的每个的拐角曲率半径为6μm或更小。