Vacuum sputter coating system and vacuum sputter coating method
The invention relates to a vacuum sputter coating system and a vacuum sputter coating method. The vacuum sputter coating system comprises a first transition chamber, a second transition chamber, a first vacuum sputter coating chamber, a second vacuum sputter coating chamber, a third transition chamb...
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creator | LIN SONGTAO |
description | The invention relates to a vacuum sputter coating system and a vacuum sputter coating method. The vacuum sputter coating system comprises a first transition chamber, a second transition chamber, a first vacuum sputter coating chamber, a second vacuum sputter coating chamber, a third transition chamber and a fourth transition chamber which are sequentially connected, and a sealing door is arranged between every two adjacent chambers. The second transition chamber, the first vacuum sputter coating chamber, the second vacuum sputter coating chamber and the third transition chamber are all in a vacuum state, and the first transition chamber and the fourth transition chamber are respectively switched between the vacuum state and the atmospheric state; the nitrogen conveying system, the vacuumizing system and the pipeline connection control system are respectively connected with the first transition chamber and the fourth transition chamber; and the pipeline connection control system is used for selectively balanci |
format | Patent |
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The vacuum sputter coating system comprises a first transition chamber, a second transition chamber, a first vacuum sputter coating chamber, a second vacuum sputter coating chamber, a third transition chamber and a fourth transition chamber which are sequentially connected, and a sealing door is arranged between every two adjacent chambers. The second transition chamber, the first vacuum sputter coating chamber, the second vacuum sputter coating chamber and the third transition chamber are all in a vacuum state, and the first transition chamber and the fourth transition chamber are respectively switched between the vacuum state and the atmospheric state; the nitrogen conveying system, the vacuumizing system and the pipeline connection control system are respectively connected with the first transition chamber and the fourth transition chamber; and the pipeline connection control system is used for selectively balanci</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240913&DB=EPODOC&CC=CN&NR=118639196A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240913&DB=EPODOC&CC=CN&NR=118639196A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIN SONGTAO</creatorcontrib><title>Vacuum sputter coating system and vacuum sputter coating method</title><description>The invention relates to a vacuum sputter coating system and a vacuum sputter coating method. The vacuum sputter coating system comprises a first transition chamber, a second transition chamber, a first vacuum sputter coating chamber, a second vacuum sputter coating chamber, a third transition chamber and a fourth transition chamber which are sequentially connected, and a sealing door is arranged between every two adjacent chambers. The second transition chamber, the first vacuum sputter coating chamber, the second vacuum sputter coating chamber and the third transition chamber are all in a vacuum state, and the first transition chamber and the fourth transition chamber are respectively switched between the vacuum state and the atmospheric state; the nitrogen conveying system, the vacuumizing system and the pipeline connection control system are respectively connected with the first transition chamber and the fourth transition chamber; and the pipeline connection control system is used for selectively balanci</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAPS0wuLc1VKC4oLSlJLVJIzk8sycxLVyiuLC5JzVVIzEtRKMOuIje1JCM_hYeBNS0xpziVF0pzMyi6uYY4e-imFuTHpxYXJCan5qWWxDv7GRpamBlbGlqaORoTowYA2E0xkQ</recordid><startdate>20240913</startdate><enddate>20240913</enddate><creator>LIN SONGTAO</creator><scope>EVB</scope></search><sort><creationdate>20240913</creationdate><title>Vacuum sputter coating system and vacuum sputter coating method</title><author>LIN SONGTAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118639196A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LIN SONGTAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIN SONGTAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum sputter coating system and vacuum sputter coating method</title><date>2024-09-13</date><risdate>2024</risdate><abstract>The invention relates to a vacuum sputter coating system and a vacuum sputter coating method. The vacuum sputter coating system comprises a first transition chamber, a second transition chamber, a first vacuum sputter coating chamber, a second vacuum sputter coating chamber, a third transition chamber and a fourth transition chamber which are sequentially connected, and a sealing door is arranged between every two adjacent chambers. The second transition chamber, the first vacuum sputter coating chamber, the second vacuum sputter coating chamber and the third transition chamber are all in a vacuum state, and the first transition chamber and the fourth transition chamber are respectively switched between the vacuum state and the atmospheric state; the nitrogen conveying system, the vacuumizing system and the pipeline connection control system are respectively connected with the first transition chamber and the fourth transition chamber; and the pipeline connection control system is used for selectively balanci</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Vacuum sputter coating system and vacuum sputter coating method |
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