Semiconductor device and preparation method thereof

The invention provides a semiconductor device, a first dielectric layer is arranged on a substrate, a plurality of mutually separated first conductive patterns and a barrier layer are arranged in the first dielectric layer, the barrier layer is located on the first conductive patterns, and at least...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HUANG JIANBIN, LIU ANQI, DING JIAGENG, ZHU AYUAN, CHEN SUNHONG, LIN YUCHUN, XIE CHAOJING, WENG QIAOHANG
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!