Image sensor and manufacturing method thereof

The invention discloses an image sensor and a manufacturing method thereof, and the method at least comprises the following steps: S1, providing a substrate which is provided with a plurality of photodiode regions and isolation regions; s2, ion implantation is carried out on the substrate, so that a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIU KAIFAN, WANG SHAOWEI, CHEN LIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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