Stage apparatus, lithographic apparatus, substrate transport method, and article manufacturing method

The invention relates to a stage apparatus, a lithographic apparatus, a substrate transport method, and an article manufacturing method. A stage apparatus includes: a substrate chuck configured to suck and hold a substrate; a pin configured to be capable of adsorbing and holding the substrate, the p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KORENAGA NOBUSHIGE, NAKAJIMA KAZUTAKA, KAMIYA SHIGEO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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