Stage apparatus, lithographic apparatus, substrate transport method, and article manufacturing method
The invention relates to a stage apparatus, a lithographic apparatus, a substrate transport method, and an article manufacturing method. A stage apparatus includes: a substrate chuck configured to suck and hold a substrate; a pin configured to be capable of adsorbing and holding the substrate, the p...
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| creator | KORENAGA NOBUSHIGE NAKAJIMA KAZUTAKA KAMIYA SHIGEO |
| description | The invention relates to a stage apparatus, a lithographic apparatus, a substrate transport method, and an article manufacturing method. A stage apparatus includes: a substrate chuck configured to suck and hold a substrate; a pin configured to be capable of adsorbing and holding the substrate, the pin configured to be capable of protruding from the substrate chuck through a hole in the substrate chuck; a driving portion configured to move one of the substrate chuck and the pin relative to the other of the substrate chuck and the pin; and a control section configured to control the driving section, in which, in a case where the substrate and the substrate chuck are separated from each other, the control section controls the driving section based on a first condition related to an ease of separation between the substrate and the substrate chuck.
本公开涉及载台设备、光刻设备、基板输送方法和物品制造方法。一种载台设备包括：配置为吸附并且保持基板的基板卡盘；配置成能够吸附并且保持基板的销，所述销配置成能够通过基板卡盘中的孔从基板卡盘突出；驱动部分，所述驱动部分被配置成使基板卡盘和销中的一个相对于基板卡盘和销中的另一个移动；以及控制部分，所述控制部分被配置成控制驱动部分，其中，在基 |
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本公开涉及载台设备、光刻设备、基板输送方法和物品制造方法。一种载台设备包括：配置为吸附并且保持基板的基板卡盘；配置成能够吸附并且保持基板的销，所述销配置成能够通过基板卡盘中的孔从基板卡盘突出；驱动部分，所述驱动部分被配置成使基板卡盘和销中的一个相对于基板卡盘和销中的另一个移动；以及控制部分，所述控制部分被配置成控制驱动部分，其中，在基</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240827&DB=EPODOC&CC=CN&NR=118550160A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240827&DB=EPODOC&CC=CN&NR=118550160A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KORENAGA NOBUSHIGE</creatorcontrib><creatorcontrib>NAKAJIMA KAZUTAKA</creatorcontrib><creatorcontrib>KAMIYA SHIGEO</creatorcontrib><title>Stage apparatus, lithographic apparatus, substrate transport method, and article manufacturing method</title><description>The invention relates to a stage apparatus, a lithographic apparatus, a substrate transport method, and an article manufacturing method. A stage apparatus includes: a substrate chuck configured to suck and hold a substrate; a pin configured to be capable of adsorbing and holding the substrate, the pin configured to be capable of protruding from the substrate chuck through a hole in the substrate chuck; a driving portion configured to move one of the substrate chuck and the pin relative to the other of the substrate chuck and the pin; and a control section configured to control the driving section, in which, in a case where the substrate and the substrate chuck are separated from each other, the control section controls the driving section based on a first condition related to an ease of separation between the substrate and the substrate chuck.
本公开涉及载台设备、光刻设备、基板输送方法和物品制造方法。一种载台设备包括：配置为吸附并且保持基板的基板卡盘；配置成能够吸附并且保持基板的销，所述销配置成能够通过基板卡盘中的孔从基板卡盘突出；驱动部分，所述驱动部分被配置成使基板卡盘和销中的一个相对于基板卡盘和销中的另一个移动；以及控制部分，所述控制部分被配置成控制驱动部分，其中，在基</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjELwjAQBeAsDqL-h3Ov0CCVrlIUJxfdy5le20CahNzl_5uhg6PLe4_Ht1X0EpwIMEZMKJkrcFbmMCWMszW_P-cPS9kEJT3HkAQWKnaoAP0AmMQaR7CgzyMaycn6aRV7tRnRMR3W3qnj_fbuHieKoSeOaMiT9N1T67Zpan2pr-d_zBeQoD_x</recordid><startdate>20240827</startdate><enddate>20240827</enddate><creator>KORENAGA NOBUSHIGE</creator><creator>NAKAJIMA KAZUTAKA</creator><creator>KAMIYA SHIGEO</creator><scope>EVB</scope></search><sort><creationdate>20240827</creationdate><title>Stage apparatus, lithographic apparatus, substrate transport method, and article manufacturing method</title><author>KORENAGA NOBUSHIGE ; NAKAJIMA KAZUTAKA ; KAMIYA SHIGEO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118550160A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KORENAGA NOBUSHIGE</creatorcontrib><creatorcontrib>NAKAJIMA KAZUTAKA</creatorcontrib><creatorcontrib>KAMIYA SHIGEO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KORENAGA NOBUSHIGE</au><au>NAKAJIMA KAZUTAKA</au><au>KAMIYA SHIGEO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Stage apparatus, lithographic apparatus, substrate transport method, and article manufacturing method</title><date>2024-08-27</date><risdate>2024</risdate><abstract>The invention relates to a stage apparatus, a lithographic apparatus, a substrate transport method, and an article manufacturing method. A stage apparatus includes: a substrate chuck configured to suck and hold a substrate; a pin configured to be capable of adsorbing and holding the substrate, the pin configured to be capable of protruding from the substrate chuck through a hole in the substrate chuck; a driving portion configured to move one of the substrate chuck and the pin relative to the other of the substrate chuck and the pin; and a control section configured to control the driving section, in which, in a case where the substrate and the substrate chuck are separated from each other, the control section controls the driving section based on a first condition related to an ease of separation between the substrate and the substrate chuck.
本公开涉及载台设备、光刻设备、基板输送方法和物品制造方法。一种载台设备包括：配置为吸附并且保持基板的基板卡盘；配置成能够吸附并且保持基板的销，所述销配置成能够通过基板卡盘中的孔从基板卡盘突出；驱动部分，所述驱动部分被配置成使基板卡盘和销中的一个相对于基板卡盘和销中的另一个移动；以及控制部分，所述控制部分被配置成控制驱动部分，其中，在基</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Stage apparatus, lithographic apparatus, substrate transport method, and article manufacturing method |
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