Low-foam developing solution and preparation method thereof

The invention discloses a low-foam developing solution and a preparation method thereof, and belongs to the technical field of developing solutions. The developing solution comprises the following components in percentage by weight: 5-20wt% of alkyne glycol ether modified organic silicon, 3-20wt% of...

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Hauptverfasser:	GONG SHENG, HE YEQIAN, ZHAO JIANGUO, WANG WEIKANG, HUANG DEXIN, XIE WEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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