Low-foam developing solution and preparation method thereof
The invention discloses a low-foam developing solution and a preparation method thereof, and belongs to the technical field of developing solutions. The developing solution comprises the following components in percentage by weight: 5-20wt% of alkyne glycol ether modified organic silicon, 3-20wt% of...
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| creator | GONG SHENG HE YEQIAN ZHAO JIANGUO WANG WEIKANG HUANG DEXIN XIE WEI |
| description | The invention discloses a low-foam developing solution and a preparation method thereof, and belongs to the technical field of developing solutions. The developing solution comprises the following components in percentage by weight: 5-20wt% of alkyne glycol ether modified organic silicon, 3-20wt% of inorganic alkali, 1-5wt% of sugar alcohol and the balance of deionized water. The alkyne glycol ether modified organic silicon is synthesized from alkyne glycol ether and hydrogen-containing polysiloxane through a hydrosilylation reaction, and the alkyne glycol ether modified organic silicon serving as a surfactant has the advantages of an organic silicon surfactant and an alkyne glycol surfactant, so that the purpose of synergistic interaction is achieved, and the defoaming capacity and the wetting capacity are more excellent. By adding the specific low-foam surfactant alkyne glycol ether modified organic silicon, foam in the developer is effectively reduced, the developing efficiency is improved, meanwhile, the |
| format | Patent |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Low-foam developing solution and preparation method thereof |
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