Photosensitive resin composition and display device
Provided is a photosensitive resin composition which forms a forward taper when forming a pattern in a low-temperature curing process and which has high hardness. An embodiment of the present invention provides a photosensitive resin composition including 100 parts by weight of an alkali-soluble res...
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| creator | YOUN HYOC-MIN KIM JIN-SUN LIU RONGJUN AHN CHANG-HWAN JUNG JONG-HO JEON SEUNG-HAN |
| description | Provided is a photosensitive resin composition which forms a forward taper when forming a pattern in a low-temperature curing process and which has high hardness. An embodiment of the present invention provides a photosensitive resin composition including 100 parts by weight of an alkali-soluble resin, 2 to 40 parts by weight of an initiator, 2 to 100 parts by weight of a polyfunctional compound, more than 1 to 30 parts by weight or less of a plasticizer, and more than 0 to 15 parts by weight or less of an epoxy-based additive.
提供一种在低温固化工程中形成图案时形成正向锥度且具有高硬度的感光性树脂组合物。本发明的一实施例提供一种包含100重量份的碱溶性树脂、2至40重量份的引发剂、2至100重量份的多官能化合物、超过1且30以下重量份的增塑剂以及超过0且15以下重量份的环氧类添加剂的感光性树脂组合物。 |
| format | Patent |
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提供一种在低温固化工程中形成图案时形成正向锥度且具有高硬度的感光性树脂组合物。本发明的一实施例提供一种包含100重量份的碱溶性树脂、2至40重量份的引发剂、2至100重量份的多官能化合物、超过1且30以下重量份的增塑剂以及超过0且15以下重量份的环氧类添加剂的感光性树脂组合物。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240809&DB=EPODOC&CC=CN&NR=118475878A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240809&DB=EPODOC&CC=CN&NR=118475878A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YOUN HYOC-MIN</creatorcontrib><creatorcontrib>KIM JIN-SUN</creatorcontrib><creatorcontrib>LIU RONGJUN</creatorcontrib><creatorcontrib>AHN CHANG-HWAN</creatorcontrib><creatorcontrib>JUNG JONG-HO</creatorcontrib><creatorcontrib>JEON SEUNG-HAN</creatorcontrib><title>Photosensitive resin composition and display device</title><description>Provided is a photosensitive resin composition which forms a forward taper when forming a pattern in a low-temperature curing process and which has high hardness. An embodiment of the present invention provides a photosensitive resin composition including 100 parts by weight of an alkali-soluble resin, 2 to 40 parts by weight of an initiator, 2 to 100 parts by weight of a polyfunctional compound, more than 1 to 30 parts by weight or less of a plasticizer, and more than 0 to 15 parts by weight or less of an epoxy-based additive.
提供一种在低温固化工程中形成图案时形成正向锥度且具有高硬度的感光性树脂组合物。本发明的一实施例提供一种包含100重量份的碱溶性树脂、2至40重量份的引发剂、2至100重量份的多官能化合物、超过1且30以下重量份的增塑剂以及超过0且15以下重量份的环氧类添加剂的感光性树脂组合物。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAOyMgvyS9OzSvOLMksS1UoSi3OzFNIzs8tyAeJ5OcpJOalKKRkFhfkJFYqpKSWZSan8jCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSSeGc_Q0MLE3NTC3MLR2Ni1AAAUYUtLg</recordid><startdate>20240809</startdate><enddate>20240809</enddate><creator>YOUN HYOC-MIN</creator><creator>KIM JIN-SUN</creator><creator>LIU RONGJUN</creator><creator>AHN CHANG-HWAN</creator><creator>JUNG JONG-HO</creator><creator>JEON SEUNG-HAN</creator><scope>EVB</scope></search><sort><creationdate>20240809</creationdate><title>Photosensitive resin composition and display device</title><author>YOUN HYOC-MIN ; KIM JIN-SUN ; LIU RONGJUN ; AHN CHANG-HWAN ; JUNG JONG-HO ; JEON SEUNG-HAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118475878A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>YOUN HYOC-MIN</creatorcontrib><creatorcontrib>KIM JIN-SUN</creatorcontrib><creatorcontrib>LIU RONGJUN</creatorcontrib><creatorcontrib>AHN CHANG-HWAN</creatorcontrib><creatorcontrib>JUNG JONG-HO</creatorcontrib><creatorcontrib>JEON SEUNG-HAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YOUN HYOC-MIN</au><au>KIM JIN-SUN</au><au>LIU RONGJUN</au><au>AHN CHANG-HWAN</au><au>JUNG JONG-HO</au><au>JEON SEUNG-HAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photosensitive resin composition and display device</title><date>2024-08-09</date><risdate>2024</risdate><abstract>Provided is a photosensitive resin composition which forms a forward taper when forming a pattern in a low-temperature curing process and which has high hardness. An embodiment of the present invention provides a photosensitive resin composition including 100 parts by weight of an alkali-soluble resin, 2 to 40 parts by weight of an initiator, 2 to 100 parts by weight of a polyfunctional compound, more than 1 to 30 parts by weight or less of a plasticizer, and more than 0 to 15 parts by weight or less of an epoxy-based additive.
提供一种在低温固化工程中形成图案时形成正向锥度且具有高硬度的感光性树脂组合物。本发明的一实施例提供一种包含100重量份的碱溶性树脂、2至40重量份的引发剂、2至100重量份的多官能化合物、超过1且30以下重量份的增塑剂以及超过0且15以下重量份的环氧类添加剂的感光性树脂组合物。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Photosensitive resin composition and display device |
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