Pixel isolation structure and manufacturing method thereof

The invention discloses a pixel isolation structure and a manufacturing method thereof. The manufacturing method comprises the following steps: S1, arranging a conductive circuit on a substrate; s2, arranging a light-emitting chip on the first surface of the substrate and conductively connecting the light-emitting chip with the conductive circuit; the light-emitting chips are arranged on the substrate to form a light-emitting array; s3, arranging a chip separating wall on the substrate; the light-emitting array and the chip separating wall form a light-emitting unit; s4, a light-transmitting isolation wall is arranged on the light-emitting unit; s5, a light-transmitting film is placed on the light-emitting unit and covers the light-emitting unit and the light-transmitting isolation wall; and S6, pressure is evenly applied to the light-transmitting film, the light-transmitting isolation wall is embedded into the light-transmitting film, and the light-transmitting film is tightly attached to the surface of the