Preparation method of laser resonant cavity
The invention discloses a laser resonant cavity preparation method, and relates to the technical field of lasers. The method comprises the following steps: preparing a first coating layer on the surface of an epitaxial layer of a silicon substrate; photoetching and preparing a second coating layer o...
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| creator | WANG JUNFEI XIA LIANG SHEN CHAO WANG QIXING YI SHULAN CHENG ZHITIAN |
| description | The invention discloses a laser resonant cavity preparation method, and relates to the technical field of lasers. The method comprises the following steps: preparing a first coating layer on the surface of an epitaxial layer of a silicon substrate; photoetching and preparing a second coating layer on the first coating layer; stripping of the second coating layer is carried out; etching of the first coating layer is carried out; and etching the epitaxial layer of the silicon substrate by taking the first coating layer and the second coating layer as barrier layers to obtain the laser resonant cavity. According to the scheme, the outer surface of the side wall of the laser resonant cavity with a relatively good form can be obtained, so that the radiative recombination rate, the external quantum efficiency, the electro-optical conversion efficiency, the service life and the like of the laser are improved.
本申请公开了一种激光器谐振腔制备方法，涉及激光器技术领域。该方法包括：在硅衬底的外延层表面制备第一镀膜层；在所述第一镀膜层上光刻并制备第二镀膜层；进行所述第二镀膜层的剥离；进行所述第一镀膜层的刻蚀；以所述第一镀膜层和 |
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本申请公开了一种激光器谐振腔制备方法，涉及激光器技术领域。该方法包括：在硅衬底的外延层表面制备第一镀膜层；在所述第一镀膜层上光刻并制备第二镀膜层；进行所述第二镀膜层的剥离；进行所述第一镀膜层的刻蚀；以所述第一镀膜层和</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240719&DB=EPODOC&CC=CN&NR=118367439A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240719&DB=EPODOC&CC=CN&NR=118367439A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG JUNFEI</creatorcontrib><creatorcontrib>XIA LIANG</creatorcontrib><creatorcontrib>SHEN CHAO</creatorcontrib><creatorcontrib>WANG QIXING</creatorcontrib><creatorcontrib>YI SHULAN</creatorcontrib><creatorcontrib>CHENG ZHITIAN</creatorcontrib><title>Preparation method of laser resonant cavity</title><description>The invention discloses a laser resonant cavity preparation method, and relates to the technical field of lasers. The method comprises the following steps: preparing a first coating layer on the surface of an epitaxial layer of a silicon substrate; photoetching and preparing a second coating layer on the first coating layer; stripping of the second coating layer is carried out; etching of the first coating layer is carried out; and etching the epitaxial layer of the silicon substrate by taking the first coating layer and the second coating layer as barrier layers to obtain the laser resonant cavity. According to the scheme, the outer surface of the side wall of the laser resonant cavity with a relatively good form can be obtained, so that the radiative recombination rate, the external quantum efficiency, the electro-optical conversion efficiency, the service life and the like of the laser are improved.
本申请公开了一种激光器谐振腔制备方法，涉及激光器技术领域。该方法包括：在硅衬底的外延层表面制备第一镀膜层；在所述第一镀膜层上光刻并制备第二镀膜层；进行所述第二镀膜层的剥离；进行所述第一镀膜层的刻蚀；以所述第一镀膜层和</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAOKEotSCxKLMnMz1PITS3JyE9RyE9TyEksTi1SKEotzs9LzCtRSE4syyyp5GFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hoYWxmbmJsaWjsbEqAEAe0Apsg</recordid><startdate>20240719</startdate><enddate>20240719</enddate><creator>WANG JUNFEI</creator><creator>XIA LIANG</creator><creator>SHEN CHAO</creator><creator>WANG QIXING</creator><creator>YI SHULAN</creator><creator>CHENG ZHITIAN</creator><scope>EVB</scope></search><sort><creationdate>20240719</creationdate><title>Preparation method of laser resonant cavity</title><author>WANG JUNFEI ; XIA LIANG ; SHEN CHAO ; WANG QIXING ; YI SHULAN ; CHENG ZHITIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118367439A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>WANG JUNFEI</creatorcontrib><creatorcontrib>XIA LIANG</creatorcontrib><creatorcontrib>SHEN CHAO</creatorcontrib><creatorcontrib>WANG QIXING</creatorcontrib><creatorcontrib>YI SHULAN</creatorcontrib><creatorcontrib>CHENG ZHITIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WANG JUNFEI</au><au>XIA LIANG</au><au>SHEN CHAO</au><au>WANG QIXING</au><au>YI SHULAN</au><au>CHENG ZHITIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Preparation method of laser resonant cavity</title><date>2024-07-19</date><risdate>2024</risdate><abstract>The invention discloses a laser resonant cavity preparation method, and relates to the technical field of lasers. The method comprises the following steps: preparing a first coating layer on the surface of an epitaxial layer of a silicon substrate; photoetching and preparing a second coating layer on the first coating layer; stripping of the second coating layer is carried out; etching of the first coating layer is carried out; and etching the epitaxial layer of the silicon substrate by taking the first coating layer and the second coating layer as barrier layers to obtain the laser resonant cavity. According to the scheme, the outer surface of the side wall of the laser resonant cavity with a relatively good form can be obtained, so that the radiative recombination rate, the external quantum efficiency, the electro-optical conversion efficiency, the service life and the like of the laser are improved.
本申请公开了一种激光器谐振腔制备方法，涉及激光器技术领域。该方法包括：在硅衬底的外延层表面制备第一镀膜层；在所述第一镀膜层上光刻并制备第二镀膜层；进行所述第二镀膜层的剥离；进行所述第一镀膜层的刻蚀；以所述第一镀膜层和</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS DEVICES USING STIMULATED EMISSION ELECTRICITY |
| title | Preparation method of laser resonant cavity |
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