Valve pulsing to control precursor pressure

A reactor system is configured to use valve pulses to control precursor pressure as part of a substrate or other process. A controller in the reactor system operates a pressure control module to process a pressure signal from a pressure sensor that senses a pressure within an accumulator disposed between the reaction chamber and the precursor source vessel. Based on the pressure setpoint of the accumulator and the sensed pressure feedback, the controller generates a valve control or valve pulse signal to operate one or more fill valves for controlling the filling of the accumulator by a gas (e.g., precursor) from the precursor source container. The fill valve may be a high speed diaphragm valve configured to be fully opened or fully closed in high temperature applications, and the control signal causes the valve to be rapidly pulsed open and closed to regulate the pressure within the accumulator. 一种反应器系统，配置为使用阀脉冲来控制前体压力，作为衬底或其他处理的一部分。反应器系统中的控制器运行压力控制模块，以处理来自压力传感器的压力信号，该压力传感器感测设置在反应室和前体源容器之间的蓄压器内的压力。基于蓄压器的压力设定