SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

The invention provides a substrate processing apparatus, a substrate processing method, a method of manufacturing a semiconductor device, and a recording medium, which can improve the uniformity of heating of a substrate in heat treatment using electromagnetic waves. The substrate processing apparat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YAMAMOTO KATSUHIKO, TAKEBAYASHI MOTONARI, SAKANO ATSUYA, NABETA KAZUYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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