Bridge type structure photoresist resin, KrF photoresist composition and preparation method thereof

The invention belongs to the technical field of photoresists, and particularly relates to a bridge-type structure photoresist resin, a KrF photoresist composition and a preparation method of the bridge-type structure photoresist resin and the KrF photoresist composition. The preparation method of th...

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Bibliographische Detailangaben

Hauptverfasser:	WANG JING, SONG LIQIAN, WANG XUEFENG, XIAO NAN, LI HEHE, ZHANG WENTING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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