Apparatus for supplying liquid target material to radiation source
The invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising: a first reservoir; a pressurization system configured to pressurize the hydraulic fluid; and a separation device configured to separate the hydraulic fluid from the liquid target material...
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| creator | VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS DIREKX DANIEL JOZEF MARIA WESTERLAKEN JAN STEVEN CHRISTIAAN JACOBS JOHANNES HENRICUS WILHELMUS FEIJTS MARCELLINUS WILHELMUS LEONARDUS HUBERTUS VAN DRENT WILLIAM PETER KNAPEN BRYAN L ROOVERS NICHOLAS J W BUIS, ERIC, J |
| description | The invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising: a first reservoir; a pressurization system configured to pressurize the hydraulic fluid; and a separation device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying a liquid target material to a radiation source.
本发明涉及一种用于将液体目标材料供应至辐射源的设备，包括：第一贮液器；加压系统，所述加压系统被配置成对液压流体加压；以及分离装置，所述分离装置被配置成将所述液压流体与所述第一贮液器中的所述液体目标材料分离且将压力从所述液压流体传送至所述液体目标材料。本发明也涉及一种将液体目标材料供应至辐射源的相关联的方法。 |
| format | Patent |
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本发明涉及一种用于将液体目标材料供应至辐射源的设备，包括：第一贮液器；加压系统，所述加压系统被配置成对液压流体加压；以及分离装置，所述分离装置被配置成将所述液压流体与所述第一贮液器中的所述液体目标材料分离且将压力从所述液压流体传送至所述液体目标材料。本发明也涉及一种将液体目标材料供应至辐射源的相关联的方法。</description><language>chi ; eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; X-RAY TECHNIQUE</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240705&DB=EPODOC&CC=CN&NR=118303134A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240705&DB=EPODOC&CC=CN&NR=118303134A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS</creatorcontrib><creatorcontrib>DIREKX DANIEL JOZEF MARIA</creatorcontrib><creatorcontrib>WESTERLAKEN JAN STEVEN CHRISTIAAN</creatorcontrib><creatorcontrib>JACOBS JOHANNES HENRICUS WILHELMUS</creatorcontrib><creatorcontrib>FEIJTS MARCELLINUS WILHELMUS LEONARDUS HUBERTUS</creatorcontrib><creatorcontrib>VAN DRENT WILLIAM PETER</creatorcontrib><creatorcontrib>KNAPEN BRYAN L</creatorcontrib><creatorcontrib>ROOVERS NICHOLAS J W</creatorcontrib><creatorcontrib>BUIS, ERIC, J</creatorcontrib><title>Apparatus for supplying liquid target material to radiation source</title><description>The invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising: a first reservoir; a pressurization system configured to pressurize the hydraulic fluid; and a separation device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying a liquid target material to a radiation source.
本发明涉及一种用于将液体目标材料供应至辐射源的设备，包括：第一贮液器；加压系统，所述加压系统被配置成对液压流体加压；以及分离装置，所述分离装置被配置成将所述液压流体与所述第一贮液器中的所述液体目标材料分离且将压力从所述液压流体传送至所述液体目标材料。本发明也涉及一种将液体目标材料供应至辐射源的相关联的方法。</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEOwjAMAMAsDAj4g3kAElEYWEsFYmJir6zWrSyF2DjOwO9ZeADTLbcOl04VDb1VmMWgNtX84bJA5nfjCRxtIYcXOhljBhcwnBidpUCVZiNtw2rGXGn3cxP2t-uzvx9IZaCqOFIhH_pHjOd0TDGduvTP-QKDszKJ</recordid><startdate>20240705</startdate><enddate>20240705</enddate><creator>VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS</creator><creator>DIREKX DANIEL JOZEF MARIA</creator><creator>WESTERLAKEN JAN STEVEN CHRISTIAAN</creator><creator>JACOBS JOHANNES HENRICUS WILHELMUS</creator><creator>FEIJTS MARCELLINUS WILHELMUS LEONARDUS HUBERTUS</creator><creator>VAN DRENT WILLIAM PETER</creator><creator>KNAPEN BRYAN L</creator><creator>ROOVERS NICHOLAS J W</creator><creator>BUIS, ERIC, J</creator><scope>EVB</scope></search><sort><creationdate>20240705</creationdate><title>Apparatus for supplying liquid target material to radiation source</title><author>VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS ; DIREKX DANIEL JOZEF MARIA ; WESTERLAKEN JAN STEVEN CHRISTIAAN ; JACOBS JOHANNES HENRICUS WILHELMUS ; FEIJTS MARCELLINUS WILHELMUS LEONARDUS HUBERTUS ; VAN DRENT WILLIAM PETER ; KNAPEN BRYAN L ; ROOVERS NICHOLAS J W ; BUIS, ERIC, J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118303134A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS</creatorcontrib><creatorcontrib>DIREKX DANIEL JOZEF MARIA</creatorcontrib><creatorcontrib>WESTERLAKEN JAN STEVEN CHRISTIAAN</creatorcontrib><creatorcontrib>JACOBS JOHANNES HENRICUS WILHELMUS</creatorcontrib><creatorcontrib>FEIJTS MARCELLINUS WILHELMUS LEONARDUS HUBERTUS</creatorcontrib><creatorcontrib>VAN DRENT WILLIAM PETER</creatorcontrib><creatorcontrib>KNAPEN BRYAN L</creatorcontrib><creatorcontrib>ROOVERS NICHOLAS J W</creatorcontrib><creatorcontrib>BUIS, ERIC, J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS</au><au>DIREKX DANIEL JOZEF MARIA</au><au>WESTERLAKEN JAN STEVEN CHRISTIAAN</au><au>JACOBS JOHANNES HENRICUS WILHELMUS</au><au>FEIJTS MARCELLINUS WILHELMUS LEONARDUS HUBERTUS</au><au>VAN DRENT WILLIAM PETER</au><au>KNAPEN BRYAN L</au><au>ROOVERS NICHOLAS J W</au><au>BUIS, ERIC, J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for supplying liquid target material to radiation source</title><date>2024-07-05</date><risdate>2024</risdate><abstract>The invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising: a first reservoir; a pressurization system configured to pressurize the hydraulic fluid; and a separation device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying a liquid target material to a radiation source.
本发明涉及一种用于将液体目标材料供应至辐射源的设备，包括：第一贮液器；加压系统，所述加压系统被配置成对液压流体加压；以及分离装置，所述分离装置被配置成将所述液压流体与所述第一贮液器中的所述液体目标材料分离且将压力从所述液压流体传送至所述液体目标材料。本发明也涉及一种将液体目标材料供应至辐射源的相关联的方法。</abstract><oa>free_for_read</oa></addata></record> |
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| title | Apparatus for supplying liquid target material to radiation source |
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