Method for improving OVL alignment problem of epitaxial layer

The invention discloses a method for improving an OVL alignment problem of an epitaxial layer. The method comprises the following steps: providing a substrate; a measurement mark is formed on the surface layer of the substrate, the measurement mark is a groove, and the side wall of the groove is rec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG XIAORI, ZHANG LEI, YU LOUFEI, YANG MENGMENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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