Methods, systems, and apparatus for radical treatment operations prior to annealing operations

Aspects of the present disclosure relate to methods, systems, and apparatus for performing a radical treatment operation on a substrate prior to performing an annealing operation on the substrate. In one embodiment, a method of processing a semiconductor substrate includes preheating the substrate,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAM NORMAN L, RIESKE ERIC R, KARP MICHAEL P, KUMAR PRADEEP SAMPATH, IU DONGMING, SHARMA SHASHANK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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