METHOD FOR DEPOSITING EUV SENSITIVE FILMS AND RELATED SYSTEM

Methods and related systems for forming an EUV sensitive film on a substrate. The method includes performing a plurality of deposition cycles. The deposition cycle includes a first deposition pulse and a second deposition pulse. The first precursor pulsing includes exposing the substrate to the firs...

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Bibliographische Detailangaben
Hauptverfasser:	PATEL, KANTIBHAI, AMBALAL, TOMCZAK YOSSI, DAVID KURT DE ROEST, DEZELAAR, CHRISTOPH, GIVENS MICHAEL, PIUMI, DOMENICO, ZURKOV, ISTV ¨ ¢ N
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	Methods and related systems for forming an EUV sensitive film on a substrate. The method includes performing a plurality of deposition cycles. The deposition cycle includes a first deposition pulse and a second deposition pulse. The first precursor pulsing includes exposing the substrate to the first precursor. The first precursor includes a metal precursor. The second precursor pulsing includes exposing the substrate to a second precursor. The second precursor includes a heterocyclic organic compound. 用于在衬底上形成EUV敏感膜的方法和相关系统。该方法包括执行多个沉积循环。沉积循环包括第一沉积脉冲和第二沉积脉冲。第一前体脉冲包括将衬底暴露于第一前体。第一前体包括金属前体。第二前体脉冲包括将衬底暴露于第二前体。第二前体包括杂环有机化合物。