Semiconductor photoresist compositions and methods of forming patterns using same

Disclosed is a semiconductor photoresist composition comprising an organotin compound represented by Chemical Formula 1 and a solvent, and a method for forming a pattern using the same. 公开一种半导体光刻胶组合物，包含由化学式1表示的有机锡化合物和溶剂；以及一种使用其形成图案的方法。...

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Hauptverfasser:	KIM JI-MIN, CHAE SEUNG YONG, IM, SANG KYUN, LEE MIN YOUNG, XU YEYIN, SUNG TAE-GEUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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