Capacitive differential pressure chip and preparation method thereof

The invention provides a capacitive differential pressure chip and a preparation method thereof, and belongs to the field of MEMS sensors, and the capacitive differential pressure chip comprises a sensitive film layer and two fixed polar plate layers. Grooves are formed in the two faces of the sensi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WANG SONGLI, LI HENG, GUAN LINLIN, SHEN JIANWU, ZHAO HU, CHEN WEITAO
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator WANG SONGLI
LI HENG
GUAN LINLIN
SHEN JIANWU
ZHAO HU
CHEN WEITAO
description The invention provides a capacitive differential pressure chip and a preparation method thereof, and belongs to the field of MEMS sensors, and the capacitive differential pressure chip comprises a sensitive film layer and two fixed polar plate layers. Grooves are formed in the two faces of the sensitive film layer, a boss is arranged in each groove, the height of each groove is larger than that of each boss, and a first electrode is arranged on the side wall of the sensitive film layer. The two fixed polar plate layers are symmetrically arranged on the two faces of the sensitive film layer, a metal coating is arranged on the side wall of each fixed polar plate layer, and a capacitor is formed by a gap between each metal coating and the boss of the corresponding sensitive film layer; each fixed polar plate layer is provided with a pressure leading hole and a conductive hole along the thickness direction; a second electrode is arranged on the face, away from the sensitive film layer, of each fixed pole plate la
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN118010228A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN118010228A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN118010228A3</originalsourceid><addsrcrecordid>eNrjZHBxTixITM4sySxLVUjJTEtLLUrNK8lMzFEoKEotLi4tSlVIzsgsUEjMSwGJFCQWJZZk5ucp5KaWZOSnKJRkANXnp_EwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NRioAWpeakl8c5-hoYWBoYGRkYWjsbEqAEA9NEzQg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Capacitive differential pressure chip and preparation method thereof</title><source>esp@cenet</source><creator>WANG SONGLI ; LI HENG ; GUAN LINLIN ; SHEN JIANWU ; ZHAO HU ; CHEN WEITAO</creator><creatorcontrib>WANG SONGLI ; LI HENG ; GUAN LINLIN ; SHEN JIANWU ; ZHAO HU ; CHEN WEITAO</creatorcontrib><description>The invention provides a capacitive differential pressure chip and a preparation method thereof, and belongs to the field of MEMS sensors, and the capacitive differential pressure chip comprises a sensitive film layer and two fixed polar plate layers. Grooves are formed in the two faces of the sensitive film layer, a boss is arranged in each groove, the height of each groove is larger than that of each boss, and a first electrode is arranged on the side wall of the sensitive film layer. The two fixed polar plate layers are symmetrically arranged on the two faces of the sensitive film layer, a metal coating is arranged on the side wall of each fixed polar plate layer, and a capacitor is formed by a gap between each metal coating and the boss of the corresponding sensitive film layer; each fixed polar plate layer is provided with a pressure leading hole and a conductive hole along the thickness direction; a second electrode is arranged on the face, away from the sensitive film layer, of each fixed pole plate la</description><language>chi ; eng</language><subject>MEASURING ; MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE ; MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES ; MICROSTRUCTURAL TECHNOLOGY ; PERFORMING OPERATIONS ; PHYSICS ; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS ; TESTING ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240510&amp;DB=EPODOC&amp;CC=CN&amp;NR=118010228A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240510&amp;DB=EPODOC&amp;CC=CN&amp;NR=118010228A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG SONGLI</creatorcontrib><creatorcontrib>LI HENG</creatorcontrib><creatorcontrib>GUAN LINLIN</creatorcontrib><creatorcontrib>SHEN JIANWU</creatorcontrib><creatorcontrib>ZHAO HU</creatorcontrib><creatorcontrib>CHEN WEITAO</creatorcontrib><title>Capacitive differential pressure chip and preparation method thereof</title><description>The invention provides a capacitive differential pressure chip and a preparation method thereof, and belongs to the field of MEMS sensors, and the capacitive differential pressure chip comprises a sensitive film layer and two fixed polar plate layers. Grooves are formed in the two faces of the sensitive film layer, a boss is arranged in each groove, the height of each groove is larger than that of each boss, and a first electrode is arranged on the side wall of the sensitive film layer. The two fixed polar plate layers are symmetrically arranged on the two faces of the sensitive film layer, a metal coating is arranged on the side wall of each fixed polar plate layer, and a capacitor is formed by a gap between each metal coating and the boss of the corresponding sensitive film layer; each fixed polar plate layer is provided with a pressure leading hole and a conductive hole along the thickness direction; a second electrode is arranged on the face, away from the sensitive film layer, of each fixed pole plate la</description><subject>MEASURING</subject><subject>MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE</subject><subject>MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES</subject><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxTixITM4sySxLVUjJTEtLLUrNK8lMzFEoKEotLi4tSlVIzsgsUEjMSwGJFCQWJZZk5ucp5KaWZOSnKJRkANXnp_EwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NRioAWpeakl8c5-hoYWBoYGRkYWjsbEqAEA9NEzQg</recordid><startdate>20240510</startdate><enddate>20240510</enddate><creator>WANG SONGLI</creator><creator>LI HENG</creator><creator>GUAN LINLIN</creator><creator>SHEN JIANWU</creator><creator>ZHAO HU</creator><creator>CHEN WEITAO</creator><scope>EVB</scope></search><sort><creationdate>20240510</creationdate><title>Capacitive differential pressure chip and preparation method thereof</title><author>WANG SONGLI ; LI HENG ; GUAN LINLIN ; SHEN JIANWU ; ZHAO HU ; CHEN WEITAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118010228A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>MEASURING</topic><topic>MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE</topic><topic>MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES</topic><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>WANG SONGLI</creatorcontrib><creatorcontrib>LI HENG</creatorcontrib><creatorcontrib>GUAN LINLIN</creatorcontrib><creatorcontrib>SHEN JIANWU</creatorcontrib><creatorcontrib>ZHAO HU</creatorcontrib><creatorcontrib>CHEN WEITAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WANG SONGLI</au><au>LI HENG</au><au>GUAN LINLIN</au><au>SHEN JIANWU</au><au>ZHAO HU</au><au>CHEN WEITAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Capacitive differential pressure chip and preparation method thereof</title><date>2024-05-10</date><risdate>2024</risdate><abstract>The invention provides a capacitive differential pressure chip and a preparation method thereof, and belongs to the field of MEMS sensors, and the capacitive differential pressure chip comprises a sensitive film layer and two fixed polar plate layers. Grooves are formed in the two faces of the sensitive film layer, a boss is arranged in each groove, the height of each groove is larger than that of each boss, and a first electrode is arranged on the side wall of the sensitive film layer. The two fixed polar plate layers are symmetrically arranged on the two faces of the sensitive film layer, a metal coating is arranged on the side wall of each fixed polar plate layer, and a capacitor is formed by a gap between each metal coating and the boss of the corresponding sensitive film layer; each fixed polar plate layer is provided with a pressure leading hole and a conductive hole along the thickness direction; a second electrode is arranged on the face, away from the sensitive film layer, of each fixed pole plate la</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN118010228A
source esp@cenet
subjects MEASURING
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE
MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PHYSICS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
TESTING
TRANSPORTING
title Capacitive differential pressure chip and preparation method thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T18%3A39%3A45IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WANG%20SONGLI&rft.date=2024-05-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN118010228A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true