Photomask of large-size spliced product and online measuring and positioning method
The invention provides a photomask of a large-size spliced product and an online measurement positioning method. The photomask of the large-size spliced product comprises at least two exposure unit areas with different functions and the same size, the four corners of each exposure unit area are resp...
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| creator | YAN DAYONG GAO CHANGCHENG LIU HONGMIN |
| description | The invention provides a photomask of a large-size spliced product and an online measurement positioning method. The photomask of the large-size spliced product comprises at least two exposure unit areas with different functions and the same size, the four corners of each exposure unit area are respectively provided with a locking angle pattern in mirror symmetry, and the locking angle patterns are located in the chip areas of the exposure unit areas; when the photomask is adopted to carry out a splicing photoetching process on a wafer, the locking angle patterns are spliced on the wafer to form a cross mark, the cross mark divides the whole chip area of the wafer into a plurality of measuring units with the same size, and each measuring unit corresponds to one exposure unit area. According to the photomask of the large-size spliced product and the online measurement positioning method, the online measurement range can be expanded, and the process difference on the wafer level can be monitored.
本申请提供一种大尺寸拼接产品 |
| format | Patent |
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本申请提供一种大尺寸拼接产品</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Photomask of large-size spliced product and online measuring and positioning method |
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