EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE

The invention relates to an exposure method, an exposure apparatus, and a method of manufacturing an article. An exposure method includes: a first layer exposure step of exposing a pattern of an original plate to a first layer on a substrate while scanning relative positions of the original plate an...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KIJIMA WATARU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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