EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE

The invention relates to an exposure method, an exposure apparatus, and a method of manufacturing an article. An exposure method includes: a first layer exposure step of exposing a pattern of an original plate to a first layer on a substrate while scanning relative positions of the original plate and the substrate in a scanning direction; and a second layer exposure step for exposing the pattern of the original plate to a second layer on the first layer while scanning the relative position in the scanning direction, the first layer exposure step including: a first step for exposing the pattern of the original plate to the second layer on the first layer; transferring a first effective region including a pattern forming region, a light shielding region provided at a position away from the pattern forming region in the scanning direction, and an alignment mark in the original plate to a first imaging region in the substrate; and a second step of transferring a second effective region including a part of the pat